Thermodynamics of High Temperature Materials Systems
Thermodynamics of High Temperature Materials Systems
Thermodynamics of High Temperature Materials Systems
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Isothermal Sections <strong>of</strong> the Ternary System Si-C-N<br />
Si 1 N 1.6 C 1.33 (VT50, Polyvinysilazane, Hoechst AG, Frankfurt, Germany)<br />
Si 1 N 0.6 C 1.02 (NCP200, Polyhydridomethylsilazane, Nichimen Corp., Tokyo, Japan)<br />
N<br />
Si 3 N 4 + 3C = 3SiC +2N 2<br />
(1)<br />
N<br />
Si 3 N 4 = 3Si + 2N 2<br />
(2)<br />
N<br />
Si 3 N 4<br />
Si 3 N 4<br />
C<br />
SiC<br />
Si<br />
C<br />
SiC<br />
Si<br />
C<br />
SiC<br />
Si<br />
T < 1484°C<br />
(1757 K)<br />
1484°C < T < 1841°C T > 1841°C<br />
(2114 K)<br />
P = 1 bar