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Normalized Raman Intensity<br />
0,060<br />
0,055<br />
0,050<br />
0,045<br />
0,040<br />
0,035<br />
0,030<br />
0,025<br />
750 800 850 900 950 1000 1050 1100 1150 1200<br />
0,04<br />
0,03<br />
0,02<br />
D1<br />
Si-OH<br />
0,12<br />
0,10<br />
0,08<br />
0,06<br />
0,04<br />
0,02<br />
0,00<br />
750 800 850 900 950 1000 1050 1100 1150 1200<br />
0,84<br />
0,80<br />
0,76<br />
0,72<br />
Si-O-Si<br />
D2<br />
0,01<br />
0,68<br />
0,00<br />
750 800 850 900 950 1000 1050 1100 1150 1200<br />
0,64<br />
750 800 850 900 950 1000 1050 1100 1150 1200<br />
Annealing Temperature (°C)<br />
J. Sol-Gel Sci. Techn. 32 (2004) 345-348<br />
J. Non-Cryst. Solids, 345-346, (2004), 570-574.
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