Electropac_06-0037_Eng Sum(excel)

Electropac Co., Inc.
Emissions Inventory
Potential
Usage
(lbs/yr) Chemical CAS # wt % RTAP VOC HAP % emitted
Uncontrolled
Actual Emissions
(tpy)
Uncontrolled
Potential
Emissions (tpy)
Product Use/Location Controlled
2005 Usage
(gals)
Specific
Gravity
2005 Usage
(lbs)
Riston Dry Film (ft3) (lbs/mmft3) Dry Film Y 1077334 50 54 116 2-ethylhexyl acrylate 103-11-7 3% x 100% 0.001 0.002
Anti-Foam 1200 NS Strip, Etch Y 133 0.9 998 2,143 glycol ethers 107-21-1 30% x 100% 0.150 0.322
Blackhole Acid Cleaner Plating Y 700 1.184 6,912 14,841 ethylene glycol 107-21-1 25% x x x 0.01% 8.64E-05 1.86E-04
Blackhole Anti Tarnish Blackhole Y 81 1.055 713 1,530 ethylene glycol 107-21-1 38% x x x 100% 0.134 0.287
PMA Solvent PISM 990 0.969 8,001 17,178 propylene glycol monomethyl ether acetate 108-65-6 98% x 100% 3.920 8.417
Multibond Acid Cleaner S Oxide Y 165 1.272 1,750 3,758 butoxyethanol 111-76-2 20% x x 100% 0.175 0.376
EMP 110 Carapace (Mask A) PISM 4838 2.205 10,668 22,904 2-butoxy ethyl acetate 112-07-2 20% x x x 100% 1.067 2.290
SR 1000 Mask Screening 12 1.16 116 249 diethylene glycol monoethyl ether acetate 112-15-2 15% x 100% 0.009 0.019
PC 421 Marking Ink Screening 52 1.45 629 1,350 diethylene glycol monobutyl ether 112-34-5 14% x 100% 0.044 0.095
Riston Dry Film (ft3) (lbs/mmft3) Dry Film Y 1077334 50 54 116 benzophenone 119-61-9 45% x 100% 0.012 0.026
Kodak 2000 RA Photo 618 1.258 6,484 13,921 hydroquinone 123-31-9 8% x x x 10% 0.026 0.056
Resist Stripper 1015 Strip, Etch Y 825 1.02 7,018 15,068 ethanolamine 141-43-5 80% x x 13% 0.365 0.784
Anti Static Film Cleaner Misc. Wiping 72 0.785 471 1,012 heptane 142-82-5 100% x x 100% 0.236 0.506
OS-108 Screen Cleaner Screening 275 1.07 2,454 5,269 alkylphenoxypolyethoxyethanol 26027-38-3 10% x 100% 0.123 0.263
SR 1000 Mask Screening 12 1.16 116 249 p-tert-butylphenyl glycidyl ether 3101-60-8 15% x 100% 0.009 0.019
EMP 110 Carapace (Mask A) PISM 4838 2.205 10,668 22,904 dipropylene glycol monomethyl ether 34590-94-8 10% x x 100% 0.533 1.145
EMP 110 Carapace (Mask B) PISM 922 2.205 2,033 4,365 dipropylene glycol monomethyl ether 34590-94-8 15% x x 100% 0.152 0.327
DF Acid copper maintenance Plating Y 220 1.01 1,853 3,979 formaldehyde 50-00-0 1% x x x 0.01% 9.27E-07 1.99E-06
OS-108 Screen Cleaner Screening 275 1.07 2,454 5,269 d-limonene 5989-27-5 10% x 100% 0.123 0.263
Alcohol Misc. Wiping 32 0.785 210 450 2-propanol 67-63-0 100% x x 100% 0.105 0.225
PMA Solvent PISM 990 0.969 8,001 17,178 2-methoxy-1-propyl acetate 70657-70-4 2% x 100% 0.080 0.172
Riston Dry Film (ft3) (lbs/mmft3) Dry Film Y 1077334 50 54 116 butanol 71-36-3 3% x x 100% 0.001 0.002
Riston Dry Film (ft3) (lbs/mmft3) Dry Film Y 1077334 50 54 116 methacrylic acid 79-41-4 3% x x 100% 0.001 0.002
Anti-Foam 1200 NS Strip, Etch Y 133 0.9 998 2,143 stoddard solvent 8052-41-3 1% x x 100% 0.005 0.011
E - Prep Solvent II DESMEAR Y 440 1.032 3,787 8,131 n-methyl-2-pyrrolidone 872-50-4 100% x x 100.0% 1.89E+00 4.07E+00
S/M Stripper 8005 HAL Y 110 1.215 1,115 2,393 n-methyl-2-pyrrolidone 872-50-4 1% x x 100% 0.006 0.012
Blackhole Anti Tarnish Blackhole Y 81 1.055 713 1,530 benzotriazole 95-14-7 3% x 100% 0.009 0.019
EMP 110 Carapace (Mask B) PISM 922 2.205 2,033 4,365 gamma-Butyrolactone 96-48-0 5% x 100% 0.051 0.109
HA-300 Flux HAL Y 660 1.1 6,055 13,000 polyethylene glycol 40% x 100% 1.211 2.600
Blackhole Replenisher Blackhole Y 275 1.1 2,523 5,417 potassium hydroxide 1310-58-3 8% x 0.1% 1.01E-04 2.17E-04
Caustic Soda 50% Waste Treatment 5496 1.53 70,130 150,573 sodium hydroxide 1310-73-2 50% x 0.1% 1.75E-02 3.76E-02
E - Prep Oxidizer 102 DESMEAR Y 60 1.53 766 1,644 sodium hydroxide 1310-73-2 50% x 0.1% 1.91E-04 4.11E-04
Macuprep G5 - B DESMEAR Y 650 1.196 6,484 13,920 sodium hydroxide 1310-73-2 1% x 0.1% 3.24E-05 6.96E-05
HA-300 Flux HAL Y 660 1.1 6,055 13,000 hydrochloric acid 7647-01-0 5% x x 0.1% 1.51E-04 3.25E-04
Muriatic Acid Gold Plating/Was Y 45 1.18 443 951 hydrochloric acid 7647-01-0 32% x x 0.1% 6.97E-05 1.50E-04
Blackhole Acid Cleaner Plating Y 700 1.184 6,912 14,841 phosphoric acid 7664-38-2 23% x 0.1% 7.95E-04 1.71E-03
Multibond Acid Cleaner S Oxide Y 165 1.272 1,750 3,758 phosphoric acid 7664-38-2 40% x 0.1% 3.50E-04 7.52E-04
Advantage 400 Etchant Strip, Etch Y 36611 1.021 311,748 669,341 ammonia 7664-41-7 x 0.255 4.668 10.022
Multibond 100 - A Oxide Y 330 1.012 2,785 5,980 sulfuric acid 7664-93-9 3% x 0.1% 4.18E-05 8.97E-05
Multibond 100 - B Oxide Y 275 1.073 2,461 5,284 sulfuric acid 7664-93-9 10% x 0.1% 1.23E-04 2.64E-04
Cu - Prep 1VL HAL Y 660 1.328 7,310 15,695 sulfuric acid 7664-93-9 10% x 0.1% 3.65E-04 7.85E-04
Sulfuric Acid Plating/Waste Y 2970 1.842 45,626 97,962 sulfuric acid 7664-93-9 93% x 0.1% 2.12E-02 4.56E-02
Nitric Acid Strip, Etch Y 90 1.408 1,057 2,269 nitric acid 7697-37-2 100% x 0.1% 5.28E-04 1.13E-03
Tin Stripper 2200 Strip, Etch Y 5280 1.15 50,640 108,728 nitric acid 7697-37-2 30% x 0.1% 7.60E-03 1.63E-02
E - Prep Oxidizer 101 DESMEAR Y 385 2.7 8,669 18,614 potassium permanganate 7722-64-7 95% x 0.1% 4.12E-03 8.84E-03
Macuprep G5 - S DESMEAR Y 310 1.005 2,598 5,579 hydrogen peroxide 7722-84-1 50% x 0.1% 6.50E-04 1.39E-03
Multibond 100C-50 Oxide Y 150 1.196 1,496 3,212 hydrogen peroxide 7722-84-1 50% x 0.1% 3.74E-04 8.03E-04
Total VOCs 10.44 22.41
Total HAPs 1.23 2.63

Electropac Co., Inc.
RTAP Summary
Potential
Emissions
(lbs/day)
Potential
Emissions
(lbs/yr)
Annual
Demin
(lbs/yr)
Annual
AAL
(ug/m3)
stack flow
rate
(acfm)
emission
rate
(ug/sec)
In-Stack
Concentration
(ug/m3)
24-hr Demin
24-hr AAL
flow rate
Adjusted
Chemical CAS #
(lbs/day)
(ug/m3)
(m3/sec)
In-Stack
formaldehyde 50-00-0 0.00001 0.004 0.01 3.8
2-propanol (isopropyl alcohol) 67-63-0 1.2324 449.81 14 5,044
n-butyl alcohol 71-36-3 0.0095 3.47 2.4 875
methacrylic acid 79-41-4 0.0095 3.47 2.8 1,010
ethylene glycol 107-21-1 1.7627 643.39 4 1,444
butoxyethanol 111-76-2 2.0593 751.64 102 37,318
2-butoxyethyl acetate 112-07-2 12.5503 4,580.87 5.2 1,892 659 439 6900 3.256253 65860.31 20225.80 50.56
hydroquinone 123-31-9 0.3051 111.37 0.079 29 10 6.7 28000 13.21378 1601.196 121.18 0.30
ethanolamine 141-43-5 4.2934 1,567.10 0.21 77 27 18 28000 13.21378 22530.6 1705.08 4.26
heptane 142-82-5 2.7728 1,012.07 65 23,681
n-methyl-2-pyrrolidone 872-50-4 22.3422 8,154.90 11 4,102 1429 952 5000 2.359604 117245 49688.41 124.22
potassium hydroxide 1310-58-3 0.0012 0.43 0.089 32
sodium hydroxide 1310-73-2 0.2089 76.25 0.26 96
hydrochloric acid 7647-01-0 0.0026 0.95 0.084 31
phosphoric acid 7664-38-2 0.0135 4.92 0.12 43
ammonia 7664-41-7 54.9165 20,044.52 0.79 287 100 100 28000 13.21378 288184.8 21809.42 54.52
sulfuric acid 7664-93-9 0.2558 93.38 0.0056 2 0.71 0.48 33000 15.57338 1342.569 86.209 0.216
nitric acid 7697-37-2 0.0956 34.89 0.15 53
potassium permanganate 7722-64-7 0.0484 17.68 0.0079 2.9 1 0.67 28000 13.21378 254.2339 19.24 0.05
hydrogen peroxide 7722-84-1 0.0120 4.40 0.078 28
stoddard solvent 8052-41-3 0.0587 21.43 21 7,581
dipropylene glycol monomethyl ether 34590-94-8 8.0690 2,945.19 24 8,750

Calculation of Emissions from Resist Stripper 1015
givens:
per manufacturer solution contains 80% by wt ethanolamine
solution used uses 3% of the solution mixed with water
molecular weight of ethanolamine = 61.1
exhaust flow rate = 200 acfm
process is operated at 130 F = 625 R = 55 C
Antoine Coefficients for ethanolamine (from Perry's Chemical Engineering Handbook, 6th edition)
a = 7.456
b= 1577.67
c= 173.370
Calculations:
the vapor pressure of pure ethanolamine at 55 C is calculated using Antoine's Equation
log p = a - [b/(T+c)] = 7.456 - [1577.67/(55+173.370)] 0.547606
p = 3.528627 mm Hg
p = 0.004643 atm
Raoult's Law states that the partial vapor pressure of each component is equal to the product of its pure vapor
pressure and its liquid mole fraction.
moles of ethanolamine = wt. Fraction/mol. wt. = 0.0003928
moles of remaining solution (assumed water) = 0.05422222
mole fraction of ethanolamine = moles ethanolamine/moles solution = 0.007192
partial vapor pressure = 0.00719 * 0.004643 =
3.3391E-05 atm
vapor concentration is calculated using the Ideal Gas Law, PV = nRT
n/V = 7.31664E-08 moles/cf
vapor concen. = n/V * mol. wt. = 4.47046E-06 lb/cf
emissions = (vapor concen.) * (flow rate * 60 min/hr) =
0.054 lbs/hr
resist stripper usage rate is approximately 0.52 lb/hr
% of solvent emitted = 0.054/(0.52*0.8) = 13%