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Backend Process Exposure Tool Backend Process ... - Sokudo

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Summary<br />

Advanced packaging litho-solution is ready .<br />

Large DOF imaging for 3D application<br />

Sufficient DOF with good vertical profile for 1.5 µm TSV<br />

2 µm line patterning with high aspect ratio for HD-RDL<br />

Through-Silicon Alignment Scope for back via process<br />

Warped Wafer handling<br />

450mm backend litho issues still to be addressed.<br />

Warped wafer handling, bonded wafer distortion, throughput…<br />

Canon will continue to contribute towards<br />

successful 450mm transformation<br />

20 th SOKUDO Breakfast Forum, July 10,2013 Slide Slide 21/23

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