Backend Process Exposure Tool Backend Process ... - Sokudo
Backend Process Exposure Tool Backend Process ... - Sokudo
Backend Process Exposure Tool Backend Process ... - Sokudo
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Depth of Focus for 1 μm pattern<br />
FPA-5510iV achieves large common DOF<br />
Reduction optics<br />
New chuck system<br />
Die-by-die tilt & focus<br />
50<br />
40<br />
FPA-5510iV<br />
Target: 1.0 μm L/S<br />
Image Field: 52 ×34<br />
Measurement points:<br />
9points / Field<br />
∆CD (%)<br />
30<br />
20<br />
10<br />
0<br />
‐10<br />
12.2 μm<br />
Measurement Points<br />
<strong>Exposure</strong> Image Field<br />
34 mm<br />
‐20<br />
‐15 ‐10 ‐5 0 5 10 15<br />
52 mm<br />
Focus (μm)<br />
20 th SOKUDO Breakfast Forum, July 10,2013 Slide Slide 8/23 8
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