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High performance sputtered LiCoO2 thin films obtained at a ...

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122 S. Tintignac et al. / Electrochimica Acta 60 (2012) 121–129<br />

Fig. 1. SEM surface observ<strong>at</strong>ions of <strong>films</strong> deposited on Al substr<strong>at</strong>e <strong>at</strong> 0.55 Pa (a), 1 Pa (b), 1.5 Pa (c), 2.2 Pa (d) and 3 Pa (e); SEM cross section observ<strong>at</strong>ion of a <strong>thin</strong> film<br />

deposited <strong>at</strong> 2.2 Pa on a Si substr<strong>at</strong>e (f).<br />

of the sputtering process. Several ways of improvements have<br />

been proposed such as the use of a moder<strong>at</strong>e annealing tre<strong>at</strong>ment<br />

(

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