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Nano-engineered ultra high gain microchannel plates - Arradiance

Nano-engineered ultra high gain microchannel plates - Arradiance

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<strong>Nano</strong>-<strong>engineered</strong> <strong>ultra</strong> <strong>high</strong><strong>gain</strong> <strong>microchannel</strong> <strong>plates</strong>D.R. Beaulieu, D. Gorelikov, P. de Rouffignac,K. Saadatmand, K. Stenton, N. Sullivan, A.S. Tremsin<strong>Arradiance</strong>, Inc.142 North Road, Suite F-150Sudbury, MA 01776, USAwww.arradiance.com


Night vision gogglesMass spectroscopyAstrophysicsSynchrotroninstrumentationBiomedical research(FLIM, FRET,…)X-Ray and UV photondetectionNeutron radiographyand Bragg edgespectroscopy3IWORID10, July 2008<strong>Arradiance</strong>.com


Event countingVery low dark currentSensitivity to photons, ions, electrons neutrals,neutrons, alpha particlesSimultaneous <strong>high</strong> spatial (~10 µm FWHM) andtemporal (~100 ps FWHM) resolutionDifferent geometries (e.g. hole in the middle)Solar blindnessLarge active area4IWORID10, July 2008<strong>Arradiance</strong>.com


Limited counting rate capabilities (


Circular-pore MCPSingle poreV 1V 26IWORID10, July 2008<strong>Arradiance</strong>.com


7IWORID10, July 2008<strong>Arradiance</strong>.com


Complex production technology;Both conduction and emission layer produced simultaneouslyand cannot be optimized independently.Large parameter deviation and low reproducibility;geometrical distortions unavoidable.Image spottiness;Not <strong>high</strong> temperature compatible;Limited lifetime;Small pore MCPs and large area MCPs are expensive toproduce;Lead contamination;8IWORID10, July 2008<strong>Arradiance</strong>.com


Sub-µm pores inanodic alumina substratesLithographically etched10 µm poresInitial attempts did not produce conformal coating.To date no fully functional MCP existsGood substrates,no continuous films9IWORID10, July 2008A. Govyadinov, et al., Nucl Instr. Meth. A 419 (1998) 667<strong>Arradiance</strong>.com


SEM image of the pore wallHoles are punched in thin films,which are laminated into thick structures10Very large pore sizes.Difficult to manufacture(stacking many substrates).Not suitable for imaging.IWORID10, July 2008Yi Whikun, et al., Rev. Sci. Instr. 71 (2000) 4165Gain vs. applied bias<strong>Arradiance</strong>.com


Pore pattern is set by photolithographyCVD growth of conduction layer and emission layer2 kx 6 µmFull field UV image(stack of 4 MCPs).Residual distortions are seenRelatively low <strong>gain</strong>.No solid edge.Long term stability.11C.P. Beetz, et al., Nucl, Instr. Meth. A 442 (2000) 443IWORID10, July 2008Gain of 4 MCP stack (40:1 each)<strong>Arradiance</strong>.com


Improvement of the emission layerlonger lifetime<strong>high</strong>er <strong>gain</strong>reduced ion feedback<strong>Nano</strong>-<strong>engineered</strong> conduction and emission layersNovel MCP substrates (new glasses or micromachined)Better uniformity / spatial resolutionIncreased lifetimeNovel photocathodes / opaque modeWithstand much <strong>high</strong>er processing temperatureVery Low noise (no radioactive traces)12IWORID10, July 2008<strong>Arradiance</strong>.com


100000Applied over commercial glass MCPs:50:1 L/D, 4.8 µm pores, ~250 MΩ resistance10000880 V new880 V treated1000V new1000 V treatedGain10001000.001 0.01 0.1 1I out (pA/pore)13IWORID10, July 20085x-10x <strong>gain</strong> increase<strong>Arradiance</strong>.com


Full field illumination image.Test MCP is irradiated by a uniformelectron flux.Photograph of the phosphor screen isshown.14IWORID10, July 2008<strong>Arradiance</strong>.com


Improved lifetime, Relaxed detector preconditioning1.21.0Relative Gain0.80.60.40.2Commercial MCP<strong>Arradiance</strong> Coated Commercial MCP50:1 L/DBias 880 V18 mm active area4.8 µm poresR ~ 100-200 MΩI out~ 10-20% I strip0.00.000 0.010 0.020 0.030 0.040 0.050Extracted Dose, C/cm 215IWORID10, July 2008Applied over commercial glass MCPs<strong>Arradiance</strong>.com


Revive aged MCP to <strong>high</strong> <strong>gain</strong> values12000Gain100008000600040002000Uncoated MCP1Coated MCP1Coated MCP250:1 L/DBias 880 V18 mm active area4.8 µm poresR ~ 100-200 MΩI out~ 10-20% I strip00.000 0.050 0.100 0.150Dose, C/cm 216IWORID10, July 2008Applied over commercial glass MCPs<strong>Arradiance</strong>.com


Can be applied to any substrate sustaining ~200 o CConformal coating / large aspect ratioMicromachinned substratesNo radioactive tracesSeparate control of conduction and emissionpropertiesReduced ion emission / long life photocathodes17IWORID10, July 2008<strong>Arradiance</strong>.com


4.8 µm pore substrate, 50:1 L/D, R~170 MΩ,<strong>gain</strong> under electron bombardment18Gain10000010000100010010120700 800 900 1000IWORID10, July 2008MCP bias (V)GainResistanceStable resistanceR (M Ω )Gain100001000880V700VTypical exponential <strong>gain</strong> increase with bias200180160140120100Good <strong>gain</strong> ~ 14000 at 1000V806040Good TCR (comparable to glass MCP values)1000.0001 0.001 0.01 0.1 1I out (pA/pore)<strong>Arradiance</strong>.com


4.8 µm pore substrate, 50:1 L/D, Bias = 880V,I out ~0.07 pA/pore, <strong>gain</strong> under electron bombardment300025002000Gain1500100050000 0.005 0.01 0.015Dose (C/cm 2 )Quickly reaches stable <strong>gain</strong>19IWORID10, July 2008<strong>Arradiance</strong>.com


10 µm pore NO LEAD glass substrate, 40:1 L/D, R~280 MΩ,<strong>gain</strong> under electron bombardment100000035010000Gain100000100001000100GainResistance30025020015010050R (M Ω )Gain1000800V700V100500 600 700 800 900 1000MCP bias (V)1000.001 0.01 0.1 1I out (pA/pore)20IWORID10, July 2008Stable resistanceTypical exponential <strong>gain</strong> increase with biasGood <strong>gain</strong> ~ 40000 at 1000V biasGood TCR (comparable to glass MCP values)<strong>Arradiance</strong>.com


4.8 µm pore substrates, 50:1 L/D,<strong>gain</strong> under electron bombardment10000010000700 V880V1000VGain10001001.E-04 1.E-03 1.E-02 1.E-01I out (pA/pore)22IWORID10, July 2008Typical count rate saturation at outputequal to ~10% of strip current<strong>Arradiance</strong>.com

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