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Φκ™λό™ό ϊΦµΦΦΤ - Controller General of Patents, Designs, and ...

Φκ™λό™ό ϊΦµΦΦΤ - Controller General of Patents, Designs, and ...

Φκ™λό™ό ϊΦµΦΦΤ - Controller General of Patents, Designs, and ...

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(12) PATENT APPLICATION PUBLICATION<br />

(19) INDIA<br />

(21) Application No.1943/DEL/2009 A<br />

(22) Date <strong>of</strong> filing <strong>of</strong> Application :17/09/2009 (43) Publication Date : 18/06/2010<br />

(54) Title <strong>of</strong> the invention : HIGH VOLTAGE VERTICAL TRANSISTOR WITH A VARIED WIDTH SILICON PILLAR<br />

(51) International classification :H01L1/00<br />

(31) Priority Document No :12/284,086<br />

(32) Priority Date :18/09/2008<br />

(71)Name <strong>of</strong> Applicant :<br />

1)POWER INTEGRATIONS INC<br />

Address <strong>of</strong> Applicant :5245 HELLYER AVENUE, SAN<br />

JOSE, CA 95138 USA.<br />

(72)Name <strong>of</strong> Inventor :<br />

1)BANERJEE SUJIT<br />

2)PARTHASARATHY VIJAY<br />

3)ZHU LIN<br />

(33) Name <strong>of</strong> priority country :U.S.A.<br />

(86) International Application No<br />

:NA<br />

Filing Date<br />

:NA<br />

(87) International Publication No :NA<br />

(61) Patent <strong>of</strong> Addition to Application Number :NA<br />

Filing Date<br />

:NA<br />

(62) Divisional to Application Number<br />

:NA<br />

Filing Date<br />

:NA<br />

(57) Abstract :<br />

In one embodiment, a vertical HVFET includes a pillar <strong>of</strong> semiconductor material a pillar <strong>of</strong> semiconductor material arranged in a<br />

loop layout having at least two substantially parallel <strong>and</strong> substantially linear fillet sections each having a first width, <strong>and</strong> at least two<br />

rounded sections, the rounded sections having a second width narrower than the first width, a source region <strong>of</strong> a first conductivity type<br />

being disposed at or near a top surface <strong>of</strong> the pillar, <strong>and</strong> a body region <strong>of</strong> a second conductivity type being disposed in the pillar<br />

beneath the source region. First <strong>and</strong> second dielectric regions are respectively disposed on opposite sides <strong>of</strong> the pillar, the first<br />

dielectric region being laterally surrounded by the pillar, <strong>and</strong> the second dielectric region laterally surrounding the pillar. First <strong>and</strong><br />

second field plates are respectively disposed in the first <strong>and</strong> second dielectric regions.<br />

No. <strong>of</strong> Pages : 27 No. <strong>of</strong> Claims : 24<br />

The Patent Office Journal 18/06/2010 15855

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