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PHYS Ashutosh Rath - Homi Bhabha National Institute

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Introduction 3<br />

configuration without direct use of conventional lithography techniques. A number of<br />

self-assembly techniques have been reported for fabricating nanoscale structures. One<br />

type of self-assembly involves the preparation of semiconductor/metal islands, and it<br />

can be carried out by a technique called heteroepitaxy, which involves the placement<br />

or deposition of the material that forms the island on a supporting substance made<br />

of a different material with a closely matched interface between them. Heteroepitaxy<br />

has been widely used for research, as well as for the fabrication of many semiconductor<br />

devices, so it is a well-developed technique. It involves bringing atoms or<br />

molecules to the surface of the substrate where they do one of three things as mentioned<br />

in the following. They are either adsorbed and diffuse about on the surface<br />

until they join or nucleate with another adatom to form an island attach themselves<br />

to or aggregate into an existing island or desorb and thereby leave the surface. Small<br />

islands can continue to grow, migrate to other positions or evaporate. There is a<br />

critical size at which they become stable and no longer experience much evaporation.<br />

Thus, there is an initial nucleation stage when the number of islands increases with<br />

the coverage. This is followed by an aggregation stage when the number of islands<br />

level off and the existing ones grow in size. Finally, there is the coalescence stage<br />

when the main events that take place involve the merger of existing islands with each<br />

other to form larger islands. There have been numerous interesting studies on the<br />

mechanism of relaxation of strain in such epitaxial layers. Strained epitaxial layers<br />

are inherently unstable and have interesting properties. It has been reported that the<br />

dislocation formation and the shape transition are the important processes by which<br />

relaxation of strain occurs [26, 27, 28, 29]. In recent years, it has been recognized<br />

that shape changes such as island formation constitute a major mechanism for strain<br />

relief [26, 28]. Tersoff and Tromp reported that a strain-induced shape transition may<br />

occur [26]. Below a critical size, islands have a compact symmetric shape. For larger<br />

sizes, they adopt a long thin shape that allows better elastic relaxation of the island’s<br />

stress [26].<br />

Metallic nanoparticles are important for both theoretical and practical view points.<br />

They represent one of the most promising classes of nano materials by virtue of<br />

their interesting optoelectronic, thermal, magnetic, and superior catalytic properties<br />

[30, 31, 33, 32], which result in the preparation of new materials for energy storage,<br />

photonics, communications and sensing application [34, 35, 36, 37]. Unlike the bulk

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