Nano-engineered ultra high gain microchannel plates - Arradiance
Nano-engineered ultra high gain microchannel plates - Arradiance
Nano-engineered ultra high gain microchannel plates - Arradiance
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4.8 µm pore substrate, 50:1 L/D, Bias = 880V,<br />
I out ~0.07 pA/pore, <strong>gain</strong> under electron bombardment<br />
3000<br />
2500<br />
2000<br />
Gain<br />
1500<br />
1000<br />
500<br />
0<br />
0 0.005 0.01 0.015<br />
Dose (C/cm 2 )<br />
Quickly reaches stable <strong>gain</strong><br />
19<br />
IWORID10, July 2008<br />
<strong>Arradiance</strong>.com
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