Nano-engineered ultra high gain microchannel plates - Arradiance
Nano-engineered ultra high gain microchannel plates - Arradiance
Nano-engineered ultra high gain microchannel plates - Arradiance
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10 µm pore NO LEAD glass substrate, 40:1 L/D, Bias = 880V,<br />
I out ~0.4 pA/pore, <strong>gain</strong> under electron bombardment<br />
1.2<br />
1<br />
0.8<br />
Gain<br />
0.6<br />
0.4<br />
0.2<br />
0<br />
Commercial MCP<br />
<strong>Arradiance</strong> emissive film only<br />
<strong>Arradiance</strong> Conductive & Emissive films<br />
0 0.01 0.02 0.03 0.04 0.05<br />
Dose (C/cm 2 )<br />
21<br />
IWORID10, July 2008<br />
Quickly reaches stable <strong>gain</strong><br />
<strong>Arradiance</strong>.com
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