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Sentaurus Structure Editor Device Editor and ... - Synopsys.com

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Figure 3. Selected steps from a process emulation sequence that Procem typically performs. The final structure is a FinFET.<br />

Three-Dimensional Process Emulator<br />

In process emulation mode (Procem), <strong>Sentaurus</strong> <strong>Structure</strong> <strong>Editor</strong><br />

translates processing steps, such as etching <strong>and</strong> deposition,<br />

patterning, fill <strong>and</strong> polish, into geometric operations. Procem<br />

supports various options such as isotropic <strong>and</strong> anisotropic etching<br />

<strong>and</strong> deposition, rounding, <strong>and</strong> blending to account for specific<br />

processing effects.<br />

Procem is fully integrated into Ligament, which is part of <strong>Sentaurus</strong><br />

Workbench. Process emulation flows can be created easily <strong>and</strong><br />

conveniently using the Ligament Flow <strong>Editor</strong>. External layout files<br />

in CIF or GDSII format can be imported into the Ligament Layout<br />

<strong>Editor</strong>.<br />

Implantation<br />

Doping profile distributions, including shadowing effects <strong>and</strong><br />

nonplanar surfaces, can be defined using imp3d – an implantation<br />

engine – thereby emulating in 3D the final distribution of an implant<br />

operation that can include diffusion.<br />

<strong>Sentaurus</strong> <strong>Structure</strong> <strong>Editor</strong> can use imp3d to create a doping<br />

profile in the device, emulating the final profile of doping<br />

implantation <strong>and</strong> diffusion steps. The result is a distribution<br />

described by a Pearson function whose moment parameters are<br />

defined by the user: st<strong>and</strong>ard deviation, skewness, <strong>and</strong> kurtosis.<br />

An additional exponential tail parameter is available.<br />

Mix-<strong>and</strong>-Match<br />

The (2D <strong>and</strong> 3D) device editor modes <strong>and</strong> three-dimensional<br />

process emulation mode can be mixed freely in a script or<br />

interactively by entering Procem Scheme <strong>com</strong>m<strong>and</strong>s at the<br />

<strong>com</strong>m<strong>and</strong>-line window. For example, a geometrically generated<br />

trench can be coated with a thin oxide layer by using a single<br />

deposition step.<br />

3

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