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Low Bias Electron Scattering in Structure ... - Researcher - IBM

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PRL 107, 146601 (2011) PHYSICAL REVIEW LETTERS<br />

week end<strong>in</strong>g<br />

30 SEPTEMBER 2011<br />

In order to exam<strong>in</strong>e whether the observed superl<strong>in</strong>ear<br />

temperature dependence of could arise from SWNT<br />

optical phonon modes [20], a numerical model is developed<br />

that calculates T ð Þ by solv<strong>in</strong>g the Boltzmann transport<br />

equation us<strong>in</strong>g a s<strong>in</strong>gle electron-phonon coupl<strong>in</strong>g<br />

g ¼ 5:3 eV= A [9]. This value of g provides the strength<br />

of the scatter<strong>in</strong>g matrix element with all the vibrational<br />

modes <strong>in</strong> the carbon nanotube (CNT) structure described<br />

by the phonon model [21]. The small-dashed l<strong>in</strong>e <strong>in</strong> Fig. 3<br />

represents the results from this model for the measured<br />

ð26; 11Þ SWNT. This model does <strong>in</strong>deed cause nonl<strong>in</strong>earity<br />

<strong>in</strong> T ð Þ. However, the calculated magnitude of the additional<br />

scatter<strong>in</strong>g is not sufficient to expla<strong>in</strong> the experiments.<br />

More fundamentally, the onset of optical phonon<br />

scatter<strong>in</strong>g ( 300 K) reflects the frequency of the radial<br />

breath<strong>in</strong>g mode, which has a well-established dependence<br />

on nanotube structure. Therefore, use of a structurally<br />

def<strong>in</strong>ed nanotube allows us to def<strong>in</strong>itively rule out radial<br />

breath<strong>in</strong>g mode scatter<strong>in</strong>g as the source of the observed<br />

superl<strong>in</strong>ear T ð Þ behavior from 100 to 300 K.<br />

Rul<strong>in</strong>g out contributions from acoustic and optical nanotube<br />

phonons as well as adsorbate-<strong>in</strong>duced scatter<strong>in</strong>g<br />

leaves only phonon modes of the underly<strong>in</strong>g substrates as<br />

a probable cause for the low electronic mean free path<br />

observed <strong>in</strong> the experiments. Similar substrate phonons<br />

have been shown to play a large role <strong>in</strong> transport properties<br />

of graphene [22], and a theoretical study on semiconduct<strong>in</strong>g<br />

SWNTs predicted the SPP modes to be important [23].<br />

To <strong>in</strong>vestigate the role of SPP scatter<strong>in</strong>g on metallic SWNT<br />

transport, its effect is <strong>in</strong>cluded <strong>in</strong> the resistivity calculations<br />

for the ð26; 11Þ SWNT. The strength of the SPP<br />

phonon scatter<strong>in</strong>g depends on the distance from the CNT<br />

to the polar substrate h and the dielectric properties of the<br />

substrate [24]. The coupl<strong>in</strong>g is strongest when the azimuthal<br />

angular momentum is conserved [25], for which case<br />

the scatter<strong>in</strong>g rate of an electron with momentum k has the<br />

form [23]<br />

1<br />

k<br />

¼ 2 @<br />

Z<br />

dq<br />

e 2 @! so<br />

<br />

e 2hq<br />

<br />

1<br />

1 þ 1<br />

<br />

1<br />

0 þ 1<br />

p<br />

qd ffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi ½n so ð" k " kþq þ @! so Þ<br />

2qðd þ 2hÞ<br />

þð1 þ n so Þð" k " kþq @! so ÞŠ; (1)<br />

where 0 and 1 are the low- and high-frequency dielectric<br />

constants of the polar substrate, respectively, d is the<br />

tube diameter, @! so is the SPP energy, and n so is the Bose-<br />

E<strong>in</strong>ste<strong>in</strong> occupation number, which leads to the activated<br />

temperature dependence. These material properties can be<br />

measured <strong>in</strong>dependently, and we use their values for<br />

SiO 2 [25] and AlN [26]. The distance from the CNT to<br />

the substrate is fixed at the van der Waals distance of<br />

h ¼ 3:5 A. The temperature dependence shown <strong>in</strong> Fig. 3<br />

is measured when the device is <strong>in</strong> the on state, i.e.,<br />

V g -V n ¼ 8V, where V n is a gate voltage correspond<strong>in</strong>g<br />

to the CNT <strong>in</strong> the charge neutral state. Us<strong>in</strong>g a<br />

classical electrostatic capacitance C g ¼ 2"" 0 =lnð4t=dÞ<br />

0:34 pF=cm for the CNT on t ¼ 300 nm SiO 2 with " ¼ 3:9,<br />

we can estimate a charge carrier density of n 1:7e=nm.<br />

For such a charge carrier density, the Fermi level is expected<br />

to lie with<strong>in</strong> the first metallic band <strong>in</strong> a 2 nm<br />

diameter CNT. Figure 3 shows the simulated temperaturedependent<br />

resistivity <strong>in</strong>clud<strong>in</strong>g SPP scatter<strong>in</strong>g for this<br />

dop<strong>in</strong>g level (solid l<strong>in</strong>e). The SPP model accurately predicts<br />

the superl<strong>in</strong>ear trend as well as absolute resistivity<br />

values. The robustness of the fit, particularly its dependence<br />

on the distance to the substrate h, is discussed <strong>in</strong><br />

detail <strong>in</strong> Ref. [27]. When h is changed by 30%, there is a<br />

15%–20% change observed <strong>in</strong> (400 K). Most importantly,<br />

because the onset temperature of SPP scatter<strong>in</strong>g<br />

depends only on the known SPP energy, the close agreement<br />

between the theory and experiment for the onset of<br />

superl<strong>in</strong>ear behavior <strong>in</strong> T ð Þ at 100 K provides direct<br />

evidence for the SPP scatter<strong>in</strong>g mechanism that does not<br />

depend on any adjustable parameters.<br />

This significant effect of SPP scatter<strong>in</strong>g <strong>in</strong> SWNTs<br />

suggests that dielectric materials with higher SPP frequencies<br />

should <strong>in</strong>crease the room-temperature mean free path.<br />

To observe the effect of chang<strong>in</strong>g substrate material on SPP<br />

L m (µm)<br />

L m (µm)<br />

4<br />

1<br />

0.2<br />

2<br />

1<br />

(a)<br />

Silicon Oxide<br />

(b)<br />

Alum<strong>in</strong>um Nitride<br />

0.3<br />

20 100 700<br />

T (K)<br />

FIG. 4 (color onl<strong>in</strong>e). SWNT mean free path vs temperature on<br />

SiO 2 and AlN surfaces. (a) L m vs T for the ð26; 11Þ SWNT on<br />

SiO 2 . (b) L m vs T for a ð17; 15) semiconduct<strong>in</strong>g SWNT with<br />

d 2:2 nmon AlN. In both plots, the dashed l<strong>in</strong>es represent<br />

simulation results us<strong>in</strong>g nanotube phonons only, while the solid<br />

l<strong>in</strong>es represent results with SPP phonons <strong>in</strong>cluded. Vertical<br />

dotted l<strong>in</strong>es represent the temperature where tube phonon calculations<br />

diverge from SPP calculations.<br />

146601-3

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