27.10.2014 Views

Low Bias Electron Scattering in Structure ... - Researcher - IBM

Low Bias Electron Scattering in Structure ... - Researcher - IBM

Low Bias Electron Scattering in Structure ... - Researcher - IBM

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

SUPPORTING INFORMATION<br />

<strong>Low</strong> bias electron scatter<strong>in</strong>g <strong>in</strong> structure-identified s<strong>in</strong>gle wall carbon nanotubes:<br />

Role of substrate polar phonons<br />

Bhupesh Chandra* #† , Vasilli Perebe<strong>in</strong>os # , Stéphane Berciaud § , Jyoti Katoch ‡ , Masa<br />

Ishigami ‡ , Philip Kim § , Tony F. He<strong>in</strong>z § , James Hone †<br />

† Department of Mechanical Eng<strong>in</strong>eer<strong>in</strong>g, Columbia University, New York, NY10027<br />

# <strong>IBM</strong> Research Division, T.J. Watson Research Center, Yorktown Heights, NY10598<br />

§ Department of Physics, Columbia University, New York, NY 10027<br />

‡ Department of Physics and Nanoscience Technology Center, University of Central<br />

Florida, Orlando, FL 32816<br />

Effect of surface to CNT distance (h) on electronic mean free path<br />

4<br />

L m (μm)<br />

1<br />

SPP Activation Temperature (SiO 2 )<br />

h = 2.5 Å<br />

h = 3.5 Å<br />

h = 5.0 Å<br />

h = Inf<strong>in</strong>ite<br />

0.2<br />

20 100 700<br />

T (K)<br />

Fig. S1. Model results for mean free path (L m ) dependence on temperature (T) at<br />

vary<strong>in</strong>g surface to nanotube distance (h) for the (26,11) metallic CNT on SiO 2

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!