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An Introduction to the Theory of Crystalline Elemental Solids and ...

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26<br />

a much richer variety <strong>of</strong> reconstructions than metal surfaces do, which is certainly <strong>the</strong><br />

case. Fortunately, however, much <strong>of</strong> <strong>the</strong> qualitative insight in<strong>to</strong> semiconduc<strong>to</strong>r surfaces<br />

has been condensed in<strong>to</strong> a series <strong>of</strong> general principles, first laid down by Duke [105, 106]<br />

<strong>and</strong> discussed at length in several o<strong>the</strong>r places [104, 107]. A discussion <strong>of</strong> <strong>the</strong> relevant<br />

principles [108] along with a few examples is sufficient <strong>to</strong> provide a flavor for how some<br />

<strong>of</strong> <strong>the</strong> most-common elemental semiconduc<strong>to</strong>r surfaces behave.<br />

The first principle which we discuss here is <strong>of</strong>ten described as <strong>the</strong> basic or guiding<br />

principle <strong>of</strong> semiconduc<strong>to</strong>r surfaces <strong>and</strong> it states that “<strong>the</strong> surface structure observed will<br />

be <strong>the</strong> lowest free energy structure kinetically accessible under <strong>the</strong> preparation conditions”.<br />

This, ra<strong>the</strong>r obvious statement, is true <strong>of</strong> any surface. However, it is especially pertinent<br />

<strong>to</strong> semiconduc<strong>to</strong>rs since which surface is observed is known <strong>to</strong> depend sensitively on<br />

cleavage, annealing, <strong>and</strong> growth conditions.<br />

Stemming from <strong>the</strong> guiding principle are a series <strong>of</strong> o<strong>the</strong>r principles. Of relevance <strong>to</strong> <strong>the</strong><br />

present discussion on elemental semiconduc<strong>to</strong>rs is one that states that “...<strong>the</strong> surface<br />

a<strong>to</strong>mic geometry is determined primarily by a rehybridization-induced lowering <strong>of</strong> <strong>the</strong><br />

surface state b<strong>and</strong>s associated with surface bonds or (filled) anion dangling bond states”.<br />

Put ano<strong>the</strong>r way this principle simply implies that a surface tends <strong>to</strong> minimize <strong>the</strong> number<br />

<strong>of</strong> dangling bonds by formation <strong>of</strong> new bonds <strong>and</strong>/or rehybridization. The concept <strong>of</strong> <strong>the</strong><br />

“dangling” bond is absolutely key <strong>to</strong> underst<strong>and</strong>ing semiconduc<strong>to</strong>r surface reconstructions.<br />

In an elemental semiconduc<strong>to</strong>r, covalent bonds between neighboring a<strong>to</strong>ms contain<br />

two spin paired electrons in, for example, an sp 3 hybrid orbital. When a surface is created<br />

at least one such bond per surface a<strong>to</strong>m is cut, leaving some sp 3 hybrid orbitals <strong>to</strong> stick<br />

out <strong>of</strong> <strong>the</strong> surface. These orbitals are called dangling bonds <strong>and</strong> <strong>the</strong>y contain less than<br />

two spin paired electrons. Dangling bonds are unstable <strong>and</strong> reactive <strong>and</strong> so <strong>the</strong> above<br />

principle is simply stating that real surfaces will relax or reconstruct <strong>to</strong> reduce <strong>the</strong> number<br />

<strong>of</strong> dangling bonds <strong>the</strong>y possess <strong>and</strong>, in so doing, minimize <strong>the</strong> <strong>to</strong>tal energy <strong>of</strong> <strong>the</strong> system.<br />

Dangling bond states are surface-localized orbitals that reside at an energy between<br />

<strong>the</strong> valence <strong>and</strong> conduction b<strong>and</strong>s. Thus <strong>the</strong>se are surface states. Naturally, dangling<br />

bonds on neighboring a<strong>to</strong>ms interact <strong>and</strong> so <strong>the</strong> dangling bond levels get broadened in<strong>to</strong><br />

b<strong>and</strong>s. As an example we show in Fig. 11 <strong>the</strong> computed surface b<strong>and</strong> structure <strong>of</strong> <strong>the</strong><br />

unreconstructed (100), (110), <strong>and</strong> (111) surfaces <strong>of</strong> Si. These are <strong>the</strong> pro<strong>to</strong>type dangling<br />

bond systems; with <strong>the</strong> dangling bonds clearly seen in <strong>the</strong> fundamental gap in each system.<br />

The o<strong>the</strong>r principle relevant <strong>to</strong> elemental semiconduc<strong>to</strong>rs is one that states that “...surfaces<br />

can lower <strong>the</strong>ir energies by a<strong>to</strong>mic relaxations leading <strong>to</strong> semiconducting (as opposed<br />

<strong>to</strong> metallic) surface state eigenvalue spectra”. Basically this principle implies that a<br />

semiconduc<strong>to</strong>r surface tends <strong>to</strong> be insulating or semiconducting but not metallic. In<br />

general, if <strong>the</strong>re is a single dangling bond per surface a<strong>to</strong>m or when two or more dangling<br />

bond b<strong>and</strong>s overlap <strong>the</strong>n <strong>the</strong> surface is metallic. O<strong>the</strong>rwise <strong>the</strong> surface is semiconducting.<br />

All three bulk-truncated surfaces <strong>of</strong> <strong>the</strong> diamond lattice shown in Fig. 8 are metallic <strong>and</strong><br />

thus liable <strong>to</strong> reconstruct.<br />

Let’s now consider how <strong>the</strong> (001) <strong>and</strong> (111) surfaces <strong>of</strong> <strong>the</strong> diamond lattice behave.<br />

First, <strong>the</strong> (001) surface. This surface, in particular <strong>the</strong> (001) surface <strong>of</strong> Si, has been<br />

examined in detail at least as much as any o<strong>the</strong>r solid surface; <strong>of</strong>ten being described<br />

as <strong>the</strong> backbone <strong>of</strong> <strong>the</strong> semiconduc<strong>to</strong>r industry. The Si(001) surface undergoes a large<br />

number <strong>of</strong> reconstructions, notably <strong>to</strong> p(2×1), p(2×2), <strong>and</strong> c(4×2) phases. We discuss

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