Inosolv 400 Fotopur - BASF.com
Inosolv 400 Fotopur - BASF.com
Inosolv 400 Fotopur - BASF.com
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Summary<br />
� The eco-efficiency study was prepared to <strong>com</strong>pare different alternatives for cleaning wafers with<br />
post plasma etch residues with different chemicals for the electronic industry. The alternative in<br />
focus is <strong>Inosolv</strong> <strong>400</strong> <strong>Fotopur</strong> as a new cleaning agent for this application It is not only the price<br />
and environmental impact of the alternative materials, which are important to the <strong>com</strong>parison. A<br />
life-cycle view should identify the strengths and weaknesses of the different alternatives.<br />
� The most eco-efficient alternative was the “<strong>Inosolv</strong> <strong>400</strong> <strong>Fotopur</strong>”-Alternative. This alternative is<br />
much more better due to costs and environmental performance than all the other alternatives<br />
under investigation. The distance to them was robust and significantly.<br />
� The use of the <strong>Inosolv</strong> system is much more sustainable than all the others under investigation<br />
and have a lot of potentials for further development to increase their sustainability in the future.<br />
Dr. P. Saling, GUP/CE, Electronic Chemicals, Systems-CR, 31/03/2006<br />
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