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Effect of Polyimide Variation and its Curing Temperature on CMOS ...

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Sensors & Transducers Journal, Vol. 103, Issue 4, April 2009, pp. 144-154resp<strong>on</strong>sible for n<strong>on</strong>-linearity <str<strong>on</strong>g>and</str<strong>on</strong>g> can be approximated as step-wise linear. The third part, shown as C,is again linear where majority <str<strong>on</strong>g>of</str<strong>on</strong>g> losses are due to c<strong>on</strong>vecti<strong>on</strong>.(a)(b)Fig. 7. Micro-heater results (a) <str<strong>on</strong>g>Temperature</str<strong>on</strong>g> pr<str<strong>on</strong>g>of</str<strong>on</strong>g>ile (b) power dissipati<strong>on</strong> curve.4.2. Characterizati<strong>on</strong> <str<strong>on</strong>g>of</str<strong>on</strong>g> the SensorTwo types <str<strong>on</strong>g>of</str<strong>on</strong>g> polyimide have been used. PI-2723 polyimide (photo-pattern able) from Dup<strong>on</strong>t [24]with the thickness <str<strong>on</strong>g>of</str<strong>on</strong>g> 2.7 µm is used as <strong>on</strong>e <str<strong>on</strong>g>of</str<strong>on</strong>g> them. <str<strong>on</strong>g>Polyimide</str<strong>on</strong>g> exhib<str<strong>on</strong>g>its</str<strong>on</strong>g> a thermal expansi<strong>on</strong> coefficient(α P = 70 х 10 -6 0 C -1 ) which is larger than those <str<strong>on</strong>g>of</str<strong>on</strong>g> silic<strong>on</strong> (α si = 2.6 х 10 -6 0 C -1 ) as well as aluminum(α AL = 0.23 х 10 -6 0 C -1 ). The resulting strain can be written as∫( α ( T ) −α( T )ε th =P AL)) dT(9)This relati<strong>on</strong> shows presence <str<strong>on</strong>g>of</str<strong>on</strong>g> strain as α P >> α AL, thereby generating tensile stress in the film. Thishas been removed by annealing at elevated temperature (≈400 0 C).<str<strong>on</strong>g>Polyimide</str<strong>on</strong>g>, P1 2555 (n<strong>on</strong> photo pattern able) is also used to fabricate vertical capacitors sensors. Theywere developed <str<strong>on</strong>g>and</str<strong>on</strong>g> rinsed using DE6180 <str<strong>on</strong>g>and</str<strong>on</strong>g> RI -9180 soluti<strong>on</strong>s. The difference in outputcapacitances <str<strong>on</strong>g>of</str<strong>on</strong>g> 4 pF comes out using photo pattern <str<strong>on</strong>g>and</str<strong>on</strong>g> n<strong>on</strong>-photo pattern able polyimide. Fig. 8shows the complete structure integrated with the micro-heater. As seen in the Fig. 9 the resp<strong>on</strong>se torelative humidity is fairy linear in the range <str<strong>on</strong>g>of</str<strong>on</strong>g> 30-80%. In higher ranges, the surface absorpti<strong>on</strong> effectcreeps in which can be minimized by turning the heater <strong>on</strong> before doing any measurement <strong>on</strong> thesensors.The general expressi<strong>on</strong> <str<strong>on</strong>g>of</str<strong>on</strong>g> capacitance as a functi<strong>on</strong> <str<strong>on</strong>g>of</str<strong>on</strong>g> relative humidity has been shown by Peter et al[3] using Looyenga’s equati<strong>on</strong>. This formula depends up<strong>on</strong> the topology <str<strong>on</strong>g>and</str<strong>on</strong>g> in our case the generalexpressi<strong>on</strong> can be writtenC=2.351.725⎛⎞⎜0.2873.55⎟× RH +100(11)⎝⎠[using the dielectric c<strong>on</strong>stant <str<strong>on</strong>g>of</str<strong>on</strong>g> polyimide <str<strong>on</strong>g>and</str<strong>on</strong>g> water as 3.0 <str<strong>on</strong>g>and</str<strong>on</strong>g> 80].151

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