pdf in English - Brion Technologies, Inc.

Brion and NuFlare Join Forces to
Improve Mask Equipment Technology
A combination of Brion s model-based computational lithography
and NuFlare s sophisticated mask equipment is expected to enhance the
semiconductor industry s mask technology
SANTA CLARA, Calif., November 5, 2008
Brion Technologies and NuFlare
Technology, Inc. today announced plans to apply their combined expertise in
computational lithography and mask equipment technology to develop new designs for
manufacturing technologies for next-generation semiconductor masks.
Brion s Tachyon technology, which is widely used to verify and correct advanced
semiconductor designs, will be used to help address the challenges of mask equipment
technology at the 32 nanometers (nm) process node and beyond. The resulting products
are expected to be marketed by NuFlare, one of the worlds leading producers of mask
writing and inspection systems.
NuFlare appreciates the contributions that Brion is making to the industrys mask
technology progress, said Kinya Usuda, director, Mask Inspection Equipment Division,
at NuFlare. This joint development effort, and ultimately our industry, will benefit from
the combined strengths of these industry leaders.
As a user of Brion s computational lithography and NuFlares reticle writing and
inspection systems, we are pleased to support this collaborative effort, said Tatsuhiko
Higashiki, senior manager, Advanced ULSI Process Engineering Dept. II, Advanced
ULSI Process Engineering Center, at Toshiba. We expect the resulting technologies to
improve the quality of masks and, ultimately, improve our own products yields and time
to market.
We are delighted to be working with NuFlare and Toshiba on this exciting new venture,
said Jim Koonmen, general manager at Brion. Our computational lithography
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technology already plays a key role in enabling leading-edge integrated circuit
manufacturing, and this partnership should accelerate the industrys ability to produce
even smaller, more powerful devices.
About NuFlare Technology
NuFlare Technology, Inc. is a supplier of mask writing systems, mask inspection
systems, and epitaxial reactor systems. NuFlare has the worlds top market share in
mask writing systems and is headquartered in Yokohama City, Kanagawa-ken, Japan.
About Brion Technologies
Brion Technologies, an ASML company, is the industry leader in computational
lithography for integrated circuits. Brion s Tachyon
platform, an OPC and OPC
verification system, enables capabilities that address chip design, mask making and
wafer printing for semiconductor manufacturing. Brion is headquartered in Santa Clara,
California. For more information: www.brion.com or www.ASML.com
Media Relations Contact
Reeka Ninomiya Corporate Communications +1 408 200 0842 Santa Clara,
California
Investor Relations Contacts
Craig DeYoung Investor Relations +1 480 383 4005 Tempe, Arizona
Franki D Hoore Investor Relations +31 40 268 6494 Veldhoven, the Netherlands
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