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[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

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[<br />

Motivation<br />

• Goal: Improvement of adhesion of PVD coatings<br />

• Objectives:<br />

<strong>–</strong> Local epitaxial growth <strong>–</strong> METAL ION SOURCE<br />

● efficient removal of surface oxides -> CLEAN<br />

INTERFACE<br />

● metal incorporation -> “DIFFUSION” BONDING<br />

<strong>–</strong> Avoid droplets -> DEFECT-FREE COATINGS<br />

<strong>–</strong> Avoid incorporation of Argon -> HIGH TOUGHNESS INTERFACE<br />

]

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