[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

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Further Reading
HIPIMS Plasma:
• High-current low-pressure quasi-stationery discharge in a magnetic field: experimental research -
Mozgrin D. V. (Moscow Eng. Phys. Inst., Russia); Fetisov I. K.; Khodachenko G. V. Source: Plasma Physics
Reports, v 21, n 5, May 1995, p 400-9
• A novel pulsed magnetron sputter technique utilizing very high target power densities - Kouznetsov,
V. (Dept. of Phys., Linkoping Univ., Sweden); Macak, K.; Schneider, J.M.; Helmersson, U.; Petrov, I. Source:
Surface and Coatings Technology, v 122, n 2-3, 15 Dec. 1999, p 290-3
• Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron
discharge - Gudmundsson, J.T. (Sci. Inst., Iceland Univ., Reykjavik, Iceland); Alami, J.; Helmersson, U.
Source: Applied Physics Letters, v 78, n 22, 28 May 2001, p 3427-9
• Influence of high power densities on the composition of pulsed magnetron plasmas - Ehiasarian, A.P.
(Materials Research Institute, Sheffield Hallam University); New, R.; Munz, W.-D.; Hultman, L.; Helmersson, U.;
Kouznetsov, V. Source: Vacuum, v 65, n 2, Apr 19, 2002, p 147-154
• The ion energy distributions and ion flux composition from a high power impulse magnetron
sputtering discharge - Bohlmark, J. (IFM Material Physics, Linkoping University); Lattemann, M.;
Gudmundsson, J.T.; Ehiasarian, A.P.; Aranda Gonzalvo, Y.; Brenning, N.; Helmersson, U. Source: Thin Solid
Films, v 515, n 4, Dec 5, 2006, p 1522-1526
• Ionized physical vapor deposition (IPVD): A review of technology and applications - Helmersson, U.
(IFM Mater. Sci., Linkoping Univ., Sweden); Lattemann, M.; Bohlmark, J.; Ehiasarian, A.P.; Gudmundsson, J.T.
Source: Thin Solid Films, v 513, n 1-2, 14 Aug. 2006, p 1-24
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