In-situ Monitoring of Atomic Layer Deposition Processes
In-situ Monitoring of Atomic Layer Deposition Processes
In-situ Monitoring of Atomic Layer Deposition Processes
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
6. Process characterization<br />
XPS study without vacuum break to analyze film growth during first ALD cycles<br />
� already small film growth deviations visible<br />
� coverage and film thickness calculable<br />
Knaut – AVS ALD 2010<br />
TMAH2OTMAH2OTMAH2OTMAH2OTMAH2OTMAH2O<br />
Dresden, 12.10.2011 <strong>In</strong>-<strong>situ</strong> <strong>Monitoring</strong> <strong>of</strong> <strong>Atomic</strong> <strong>Layer</strong> <strong>Deposition</strong> <strong>Processes</strong> TU<br />
Al 2 O 3 ALD with H 2 O and<br />
TMA (trimethylaluminium)<br />
on ALD Ru<br />
� slightly inhibited<br />
growth during<br />
first Al2O3ALD<br />
cycles on Ru<br />
slide 16<strong>of</strong> 21
Change language