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The Red Brick Wall of Traditional Semiconductor Electronics The ...

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CMOS Technology Breakthrough Takes Time…<br />

Tool or Technology<br />

Silicon epitaxy<br />

APCVD silicon nitride<br />

Ion implantation<br />

TiW metallization<br />

Charge-coupled devices (CCD)<br />

Reactive ion etch (RIE)<br />

Poly-Si emitter<br />

Refractory gate<br />

SIMOX (SOI via implantation)<br />

Trench capacitors<br />

Silicide (self-aligned)<br />

Lightly-doped drain (LDD)<br />

developed<br />

1960<br />

1965<br />

1969<br />

1970<br />

1970<br />

1975<br />

1976<br />

1976<br />

1978<br />

1979<br />

1978<br />

1980<br />

In production<br />

1964<br />

1968<br />

1973<br />

1976<br />

1981<br />

1980<br />

1984<br />

1983<br />

1989<br />

1986<br />

1985<br />

1986<br />

∆<br />

4<br />

4<br />

4<br />

6<br />

11<br />

5<br />

8<br />

7<br />

11<br />

7<br />

7<br />

6

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