= 8 kV, L = 9 cm and with operating pressure in the range of P =0.5 to 2.5 mbar argon, up to 102 mJ of EUV photon energy can be produced and in this case, no X-ray photon is produced. We expect the electron temperature achieved in this case to be in the range of several tens electron-volts. If one is currently having the UNU/ICTP PFF and intend to use it as an EUV source to test for the effect of EUV on a substract which has good absorption in both the X-ray and EUV regions, it may be necessary to eliminate the X-ray component of the emission. In this case the 1. Banine V. and R. Moors (2004) J. Phys. D: Appl. Phys. 37: 3207. 2. 3. Mohanty S.R., Robert E., Dussart R., Viladrosa R., Pouvesle J.M., Fleurrier C. and Cachoncinlle C. (2003) Microelectron. Eng. 65: 47. Hong D., Dussart R., Cachoncinlle C., Ressenfeld W.E.S., Gotze S., J. Pons J., Viladrosa R., Fleurier C. and Pouvesle J.M. (2000) Rev. Sci. Instrum. 71: 15. 4. Xiaoming G., Meisheng X., Rubin Y., Chaofeng H., Wirpszo K.W. and Emilio P. (2001) Proc. SPIE 4343: 491. 5. Chew S.H. and Wong C.S. (2006) J. Sci. & Technol. in the Tropics 2: 125. 6. 7. Fomenkov I.V., Ness R.M., Oliver I.R., Melnychuk S.T., Khodykin O.V., Bowering N.R., Rettig C.L. and Hoffman J.R. (2003) Proc. SPIE 5037: 807. Rawat R.S., Zhang T., Phua C.B.L., Then J.X.Y., Chandra K.A., Lin X., Patran A. and Lee P. (2004) Plasma Sources Sci. Technol. 13: 569. REFERENCES scaled down operation of the existing UNU/ICTP PFF may be a possible solution. With this possibility demonstrated, it is still necessary to point out that the device can be further tuned to obtain the condition for optimum EUV output. Acknowledgements – The authors would like to extend their great appreciation to Asian African Association for Plasma Training (AAAPT) for its support to initiate plasma focus research in this laboratory and to the Graduate School, Chulalongkorn University for financial support. 8. Lee S., Tou T.Y., Moo S.P., Eissa M.A., Gholap A.V., Kwek K.H., Mulyodrono S., Smith A.J., Suryadi S., Usada W. and Zakaullah M. (1988) Am. J. Phys. 56: 62. 9. Yap S.L., Wong C.S., Choi P., Dumitrescu C. and Moo S.P. (2005) Jpn. J. Appl. Phys. 44: 8125. 10. Favre M., Lee S., Moo S.P. and Wong C.S. (1992) Plasma Sources Sci. Technol. 1: 122. 11. Mohammadi M.A., Verma R., Sobhanian S., Wong C.S., Lee S., Springham S.V., Tan T.L., Lee P. and Rawat R.S. (2007) Plasma Sources Sci Technol. 16: 785. 12. Ng C.M., Moo S.P. and Wong C.S. (1998) IEEE Trans. Plasma. Sci. 26: 1146. 13. http://Spectr-w3.snz.ru 14. http://129.105.69.13/datasheets/Optoelectronics/ Photodiode_UDT_catalog.pdf http://www.ird-inc.com Jostt vol 6.indd 47 7/22/10 10:09:28 PM 15. 47 Journal of Science and Technology in the Tropics (2010) 6: 43-47
Journal of Science and Technology in the Tropics (2009) 5: 133-139 Jostt vol 6.indd 48 7/22/10 10:09:28 PM