Surface and bulk passivation of multicrystalline silicon solar cells by ...
Surface and bulk passivation of multicrystalline silicon solar cells by ...
Surface and bulk passivation of multicrystalline silicon solar cells by ...
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LIST OF FIGURES<br />
Figure<br />
Page<br />
1.1 World <strong>solar</strong> module production 1980-2000 [ 16] 4<br />
I.2 A schematic <strong>of</strong> photo generation effect .......................................... . ........ 5<br />
I.3 An electrical equivalent circuit <strong>of</strong> a <strong>solar</strong> cell .......................................... 7<br />
I.4 The I-V characteristic <strong>of</strong> a. <strong>solar</strong> cell with maximum power point [17] 8<br />
1.5 Solar cell production <strong>and</strong> capacity [28] II<br />
1.6 An. illustration <strong>of</strong> a. typical crystalline Si <strong>solar</strong> cell [29] 13<br />
1.7 A pictorial representation <strong>of</strong> • various types <strong>of</strong> point, line, area <strong>and</strong> volume<br />
defects: (a) foreign interstitial; (b) dislocation; (c) self-interstitial; (d)<br />
precipitate; (e) extrinsic stacking fault <strong>and</strong> partial dislocation; (f) foreign<br />
substitutional; (g) vacancy; (h) intrinsic stacking fault surrounded <strong>by</strong> a partial<br />
dislocation; (i) foreign substitutional [30] .. 14<br />
2.1 SEM picture <strong>of</strong> a typical texturized <strong>silicon</strong> surface using conventional NaOH<br />
texturization bath [39]<br />
2.2 " The calculated reflectance spectra <strong>of</strong> a bare Si wafer for different surface<br />
conditions: (a) polished <strong>and</strong> (b) (I00) textured. Wafer thickness =300 μm [40]<br />
2I<br />
21<br />
2.3 The calculated reflectance spectra <strong>of</strong> a Si wafer coated with SiN (n=2 <strong>and</strong><br />
a=5.0): _double sided polished (solid line) <strong>and</strong> (I00) double sided textured<br />
(dotted line). Wafer thickness = 30 .0 μm [42] ........................................... 23<br />
2.4 The spectrum <strong>of</strong> AM1.5 radiation [43] 24<br />
2.5 Deposition <strong>of</strong> SiNx:H fir in (a) a direct-plasm reactor <strong>and</strong> (h) a remote-plasm<br />
reactor[50] 28<br />
2.6 The refractive index as a function <strong>of</strong> N/Si ration for SiΝ X:H films [52] .A line is<br />
drawn through the data for visual guidance only 29<br />
xii