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Surface and bulk passivation of multicrystalline silicon solar cells by ...

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ratio, <strong>and</strong> the amount <strong>of</strong> unbound H. As a result, a wide range <strong>of</strong> properties can be<br />

obtained <strong>by</strong> managing these structural <strong>and</strong> chemical properties <strong>by</strong> manipulating the<br />

deposition parameters [42].<br />

Optical properties, such as absorption, reflection <strong>and</strong> refractive index <strong>of</strong> the SIN<br />

AR coating, depend significantly on the concentration <strong>and</strong> chemical distribution <strong>of</strong><br />

hydrogen, <strong>silicon</strong> <strong>and</strong> nitrogen in the film, i.e., on the deposition conditions, which are<br />

controlled <strong>by</strong> the N/Si ratio (x) in the films. For small x, the hydrogen-bonding<br />

configuration consists <strong>of</strong> isolated Si—H bonds, with no adjacent Si—N bonds. As x<br />

increases, multi-N-bonded Si—H bonds dominate the structure. For x>1, N—H bonds start<br />

to form <strong>and</strong> increase with x. Thus, a means <strong>of</strong> controlling the material properties <strong>of</strong> the<br />

SiN X films consists <strong>of</strong> simply adjusting the x value <strong>by</strong> changing the nitrogen content.<br />

Figure 2.6 The refractive index as a function <strong>of</strong> N/Si ratio for SiΝ :Η films [52]. A line is<br />

drawn through the data for visual guidance only.

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