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CMOS Scaling Realities: Pitch Degradation<br />

Significant innovation in performance‐enhancing elements required<br />

Node<br />

(nm)<br />

PC Pitch<br />

(m)<br />

180 0.7<br />

130 0.5<br />

90 0.35<br />

65 0.23<br />

45 0.18<br />

32 0.13<br />

22 0.1<br />

Relative Performance<br />

1.40<br />

1.35<br />

1.30<br />

1.25<br />

1.20<br />

1.15 Scaling In The Past…<br />

1.10<br />

1.05<br />

1.00<br />

0.95<br />

0.90<br />

0.85<br />

0.80<br />

Higher Capacitance<br />

Reduced Stress<br />

Scaling Now<br />

Channel Scaling<br />

High-k / Metal Gate<br />

Body Controlled Devices<br />

Reduced Gate Height<br />

Advanced BEOL Dielectric<br />

Higher Resistance<br />

Scaling<br />

Requirements<br />

ISA CXO Conclave –Nov 2012 13

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