Annual Report 2012 - Latvijas Universitātes Cietvielu fizikas institūts
Annual Report 2012 - Latvijas Universitātes Cietvielu fizikas institūts
Annual Report 2012 - Latvijas Universitātes Cietvielu fizikas institūts
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Modified yarn strength decreases by 30%, which correlated with the moisture content<br />
(6-12 %wt). Relative strength at 280 O C yarn with active particles respect to unmodified<br />
increased in the direction Cu, Cu 2 O and CuO (fig.4; Fig.5).<br />
Fig. 4. Breaking load, 240 o C<br />
Fig. 5. Breaking load, 280 o C<br />
PREPARATION OF TiO 2 THIN FILMS BY PARTICULATE<br />
SOL-ELECTROPHORETIC DEPOSITION<br />
G.Bajars, I.Liepina, A. Lusis, J.Gabrusenoks, E. Pentjuss<br />
Titanium dioxide thin films have been extensively studied because of their<br />
excellent properties for photocatalysis, gas sensors, ultrafiltration membranes, selfcleaning<br />
coatings, solar cells and photovoltaic applications. Many efforts have been<br />
made to improve their properties by preparing porous films with high surface area.<br />
There are a wide variety of preparation methods for TiO 2 thin films, e.g. sol-gel, doctor<br />
blade, spin coating, chemical vapor and sputter deposition. In this study nanocrystalline<br />
TiO 2 thin films have been prepared by sol-electrophoretic deposition process.<br />
The first step was the preparation of TiO 2 sol. Titanium tetra-iso-butoxide<br />
(TTIB) was used as a precursor, hydrochloric acid as a catalyst for the peptization and<br />
deionized water as a dispersion media. A water-acid mixture was stabilized at 50 °C<br />
with continuous stirring. An appropriate amount of TTIB was added next forming the<br />
white precipitate that gradually peptized forming a clear sol.<br />
For the electrophoresis growth, the Pt anode and cathode are placed parallel in an<br />
TiO 2 sol with a distance 1 cm in between. The cathodes used were metallic Cu and Ti,<br />
thin Pt layer on silicon, transparent indium tin oxide (ITO) on glass. A constant voltage<br />
of 0.5 – 0.6 V was applied by a dc power supply between the electrodes and held for 1 –<br />
3 h. The as-deposited thin films were first dried at 100 °C for 24 h and then heated at a<br />
rate of 10 °C/min and were finally annealed at 500 °C for 2 h.<br />
Obtained TiO 2 thin films were characterized by phase composition, morphology<br />
and their microstructures using X-ray diffraction, Raman spectroscopy, as well as<br />
transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The<br />
optical properties of TiO 2 thin films were investigate by analyzing I – V curves. The<br />
possible correlations between the optical and structural properties of thin films are<br />
discussed.<br />
TiO2 thin films have been obtained by a sol-electrophoretic deposition method<br />
on metallic Ti and Pt substrates. X-ray diffraction, Raman spectroscopy and scanning<br />
electron microscopy were used to investigate the structure and morphology of plated<br />
materials. Annealed TiO2 films mainly are formed in anatase structure with different<br />
morphology depending on substrate material. Light induced potential measurements<br />
indicate that the morphology substantially have an impact on photoactivity of TiO2 thin<br />
films.<br />
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