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PhD thesis - Evans Research Group - University of Wisconsin-Madison

PhD thesis - Evans Research Group - University of Wisconsin-Madison

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10The metal evaporation was followed by the lift-<strong>of</strong>f process (Fig. 1.3(f)). The sample wasdipped in acetone under sonication for 10 min to remove PR.SiO 2Si(a)SiO 2Si(d)PhotoresistSiO 2Si(b)UVAuSiO 2Si(e)AuMaskPhotoresistSiO 2Si(c)AuSiO 2Si(f)AuFig. 1.3: Fabrication steps <strong>of</strong> a bottom contact-FET device. (a) thermally grown oxide, (b)spinning the PR, (c) patterning and exposing the PR, (d) developing the PR, (e) depositingmetal electrodes and (f) removing the PR (lift-<strong>of</strong>f)1.3 Physics <strong>of</strong> organic semiconductor1.3.1 IntroductionOrganic semiconductor molecules have conjugated structures with alternating single and

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