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Characterization of vacancy-type defects in silicon using deep level ...

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III. Def<strong>in</strong>ition <strong>of</strong> tasks• Determ<strong>in</strong>e the energy position and electron capture cross section <strong>of</strong> the dom<strong>in</strong>ant electronstates <strong>in</strong> the energy band gap <strong>of</strong> proton-irradiated high purity epitaxial <strong>silicon</strong> (n-<strong>type</strong>)• Determ<strong>in</strong>e the concentration and generation rate <strong>of</strong> the dom<strong>in</strong>ant electron states as afunction <strong>of</strong> proton dose• On the basis <strong>of</strong> comparison with literature data, identify the orig<strong>in</strong> <strong>of</strong> the dom<strong>in</strong>antelectron states• Perform isothermal anneal<strong>in</strong>g studies to determ<strong>in</strong>e the thermal stability and anneal<strong>in</strong>gk<strong>in</strong>etics <strong>of</strong> the dom<strong>in</strong>ant electron states• Conclude about the radiation hardness <strong>of</strong> the <strong>in</strong>vestigated samples (devices/detectors) andpossibly predict their lifetime <strong>in</strong> (i) the Large Hadron Collider (LHC) at CERN and (ii) asatellite exposed to the Van Allen radiation belt.IV. References[1] B.G. Streetman and S. Banerjee, Solid State Electronic Devices, Prentice HallInternational Inc., 6 th edition (2006).[2] See for example, M. Mikelsen, Thermal evolution <strong>of</strong> irradiation <strong>in</strong>duced <strong>defects</strong> <strong>in</strong> Siliconand Silicon Carbide, PhD thesis, University <strong>of</strong> Oslo (2007), and references there<strong>in</strong>.[3] J.W. Corbett, G.D. Watk<strong>in</strong>s, R.M. Chrenko and R.S. McDonald, Phys. Rev. 121, 1015(1961); G.D. Watk<strong>in</strong>s and J.W. Corbett, Phys. Rev. 121, 1001 (1961).[4] J.W. Corbett and G.D. Watk<strong>in</strong>s, Phys. Rev. Lett. 7, 314 (1961); G.D. Watk<strong>in</strong>s and J.W.Corbett, Phys. Rev. 138, A543 (1965).[5] W. Shockley and W.T. Read, Phys. Rev 87, 835 (1952).[6] D.V. Lang, J. Appl. Phys. 45, 3023 (1974).[7] Institute <strong>of</strong> Electronic Materials Technology (ITME), Warszaw, Poland.12

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