Cu CMP Cleaning - Avsusergroups.org

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2-Step Clean• A 2-step clean, high pHfollowed by low pH,shows good Cucontamination removal• Evidence from leakagecurrent data• However, damage tofront-end devicesreported compared toone-step, high pH clean• Also, unique corrosiondefect observedCumulative Probability100908070605040302010010.90.80.70.6Normalized DataESC 784 + MR10ESC 784 onlyESC 784 + ElectracleanESC 784 + DHF0.5February 200210
Corrosion Defect• Cu corrosion defectseen with 2-stepcleaning process• Observed at severalcustomers withdifferent chemistries• High pH, followed bylow pH in each case• High pH-only and lowpH-only do not createthis defectFebruary 200211
Page 1 and 2: Cu CMP CleaningAqueous, Alkaline Ch
Page 3 and 4: Introduction• Focus is on develop
Page 5: ESC Chemical Formulations• Base F
Page 8 and 9: Cu CompatibilityESC Products includ
Page 12 and 13: 1-Step, High pH Clean• Several cu
Page 14 and 15: Applied MIRRA MESA Data• Customer
Page 16 and 17: BTA Removal• BTA is typically use
Page 18 and 19: CMP Equipment Supplier Experience
Page 20 and 21: Cost of Ownership• 20:1 to 40:1 d

Cu CMP Cleaning - Avsusergroups.org

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