Cu CMP Cleaning - Avsusergroups.org

Cost of Ownership• 20:1 to 40:1 dilution– 10 - 30 ml of concentrate per wafer• No particle loading in brushes• Easily rinsed with DI water• 30-45 sec chemical process time can be performedin a single station with excellent results• Reduced waste treatment cost compared tofluorinated chemistriesFebruary 200220