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Power Electronics Technology

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DESIGNfeature<br />

MICHAEL DE ROOIJ, Ph.D., Executive Director of Applications Engineering, Efficient <strong>Power</strong> Conversion Corporation<br />

JOHAN STRYDOM, Ph.D., Vice President, Applications, Efficient <strong>Power</strong> Conversion Corporation<br />

eGaN ® FET- Silicon <strong>Power</strong> Shoot-<br />

Out: Small Signal RF Performance<br />

In this eGaN FET-silicon power<br />

shoot-out series article, we<br />

examine RF performance<br />

using the 200 V EPC2012 [3]<br />

eGaN FET as a starting point.<br />

The eGaN FET is optimized<br />

as a power-switching device<br />

but also exhibits good RF<br />

characteristics. Future eGaN<br />

FET parts can be optimized<br />

for better RF performance at<br />

higher frequencies.<br />

1621<br />

Gate Circuit<br />

Reference Plane<br />

Device Outline<br />

914<br />

349<br />

271<br />

135.3<br />

Unlike power switching FETs, RF FETs are designed to work best<br />

in the linear region of operation to maximize power gain and<br />

minimize distortion, whereas power switching devices are optimized<br />

for lowest R DS(ON) and gate charge [1,2,3,17,18,19,20]. Another<br />

significant difference between power switching and RF FETs is the<br />

power dissipation capability of RF devices is significantly higher<br />

than that of power switching devices for equivalent terminal characteristics<br />

to accommodate the higher power losses in the linear region.<br />

We will focus on RF characterization in the frequency range from 200 MHz<br />

through 2.5 GHz, the results of which can be used to design a pulsed power RF<br />

amplifer.<br />

RF CHARACTERIZATION<br />

Prior to being able to compare various RF FETs with each other they need to be<br />

properly characterized, which can accomplished by measuring the S-parameters<br />

of the FET while regarding it as a 2-port network under controlled bias conditions.<br />

A test fixture was designed for the EPC2012 to connect the RF signals to the FET<br />

and to provide the necessary S-parameter measurement reference planes from<br />

which the dataset would be valid. The test fixture design used a 30 mil thick Rogers<br />

4350 substrate [21] , chosen for its low losses at higher frequencies. This allowed the<br />

design to be suitable for frequencies as high as 12 GHz. Fig. 1 shows the reference<br />

plane design and highlights the outline of the EPC2012 device. The transmission<br />

lines to the device Gate and Drain were designed as microstrip transmission lines<br />

with 50 Ω characteristic impedance.<br />

271<br />

914<br />

1621<br />

Drain Circuit<br />

Reference Plane<br />

Fig. 1. Reference plane design for the EPC2012 eGaN FET using a 30 mil thick Rogers<br />

4350 substrate.<br />

The test fixture was also equipped with a negative<br />

temperature co-efficient thermistor (NTC) placed in<br />

close proximity to the source pad of the eGaN FET to<br />

provide an indication of the temperature of the copper<br />

in that area without affecting the RF performance.<br />

The EPC9903 test fixture in Fig. 2 shows the right side<br />

image showing the top mounted heat-sink. The EPC<br />

FET has a lower thermal resistance [3] from junction to<br />

the top side of the device, compared to the bottom side<br />

(soldered), and hence mounting the heat-sink to the<br />

back side of the device has a high impact on the power<br />

dissipation capability of the device.<br />

Due to thermal limitations of the test fixture and the<br />

EPC2012 device, testing of the eGaN FET was pulsed<br />

with a low duty cycle with the average power dissipation<br />

kept below 0.7 W without the heat-sink, and 5 W<br />

with the heat-sink and forced air cooling. The heat-sink<br />

used was 15 mm x 15 mm x 14.5 mm high, supplied by<br />

www.powerelectronics.com June 2013 | <strong>Power</strong> <strong>Electronics</strong> <strong>Technology</strong> 19

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