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Why Silicon Photonics? - Institute of Microelectronics - A*Star

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People<br />

IME is indeed an excellent training<br />

place for researchers and engineers<br />

specializing in semiconductor<br />

research.<br />

Zhao Hui<br />

a former PhD student attached to IME.<br />

Graduated recently from the National University <strong>of</strong><br />

Singapore (NUS), Zhao Hui is one <strong>of</strong> the pool <strong>of</strong> students<br />

who have pursued their PhD project in a research<br />

institute through A*STAR research attachment programme. She<br />

was attached to IME’s Nano-Electronics & <strong>Photonics</strong> (NanoEP)<br />

Programme for three years under the Joint <strong>Microelectronics</strong><br />

Laboratory (JML) scheme from the Department <strong>of</strong> Electrical and<br />

Computer Engineering.<br />

When the editorial team caught up with the young post graduate,<br />

she was all perky and excited about the interview. The bubbly<br />

graduate was fast to get down to the interview and quipped, “The<br />

attachment opportunity in IME was arranged by my university’s<br />

supervisor but the main motivation factors for me were its first<br />

class facilities and expertise in the field <strong>of</strong> nan<strong>of</strong>abrication.”<br />

Zhao Hui recently joined one <strong>of</strong> the largestelectronic design<br />

automation (EDA) company for IC industry, Synopsys, as a<br />

Corporate Application Engineer. Looking back on her attachment<br />

in IME, she said, “I had gained and picked up important technical<br />

knowledge from my attachment in IME. I was given opportunities<br />

to propose and test out my ideas through experiments with the<br />

comprehensive facilities in the institute. These had given me<br />

invaluable hands-on experience <strong>of</strong> the equipment and processes<br />

in nano device fabrication.”<br />

Zhao Hui was working on the design, fabrication and characterization<br />

<strong>of</strong> Nanowire devices during her attachment. “I<br />

had simulated, designed, and fabricated the test keys for<br />

femto-farad nanowire capacitance measurement. The fabricated<br />

devices were used for measurement <strong>of</strong> current and capacitance.<br />

Series resistance and carrier mobility were then extracted for<br />

further device study”, she disclosed. Under the guidance <strong>of</strong> Dr.<br />

Subhash, Zhao Hui’s research work on “CBCM Measurement <strong>of</strong><br />

Femto-Farad Nanowire Capacitance” was published in IEDM<br />

2008. This is the first demonstration <strong>of</strong> a single channel silicon<br />

nanowire capacitance and mobility extraction. “It provides a very<br />

simple and innovative approach to measuring extremely small<br />

capacitances accurately. I am very proud and pleased <strong>of</strong> the<br />

result and I want to thank the team for their contribution”, Zhao<br />

Hui continued.<br />

”My supervisor at IME was Dr. Subhash Chander and I could<br />

not wish for any better or friendlier supervisor than him. Apart<br />

from his expertise in modeling and characterization, he is<br />

also a very patient and bighearted mentor. His generosity in<br />

sharing his knowledge and patience helped me most during<br />

my attachment. As a very hands-on person, he would sit down<br />

with us to brainstorm, whenever we experience any difficulties<br />

in the research work. Through his guidance, I learnt that to be<br />

an outstanding researcher, apart from overcoming the technical<br />

challenges, it also involving prioritizing, working in a team and<br />

managing stress. I am extremely fortunate to work with IME and<br />

Dr. Subhash over the past 3 years. It is an experience I would<br />

cherish forever.”<br />

18 <strong>Institute</strong> <strong>of</strong> <strong>Microelectronics</strong>

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