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Graphene-on-SiC - ISOM

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GaN epitaxy for<br />

power electr<strong>on</strong>ics<br />

• In-situ SiN capping layer<br />

- Optimal surface states passivati<strong>on</strong><br />

- Material robustness<br />

- Enhanced device reliability – stability<br />

• Wafer Diameter: up to 200 mm<br />

• Materials capability:<br />

- SiN/AlGaN/GaN HEMTs<br />

- SiN/AlN/GaN<br />

- (In)(Al)GaN – based heterostructures<br />

• Substrates:<br />

- Si (111)<br />

- <strong>SiC</strong><br />

For more informati<strong>on</strong>, please visit www.epigan.com<br />

or c<strong>on</strong>tact info@epigan.com<br />

EpiGaN nv · Kempische Steenweg 293 · B-3500 Hasselt · Belgium · Ph<strong>on</strong>e +32 11 56 66 20<br />

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