076_10 RZ PRiMELiNE c-Si :Layout 1 - Roth & Rau AG

PRiMELiNE c-Si
Turnkey Solutions for
Advanced Solar Cell Manufacturing

PRiMELiNE
Turnkey Solutions by Roth & Rau
All from one Source
Highest cell efficiency
Highest yield
Highest throughput
Optimum Uptime
Software controlled manufacturing
Worldwide professional Service
MES software solutions
As providers of package solutions, Roth & Rau and its subsidiaries
offer custom-tailored IT solutions for the entire life cycle of production
from simulation through production control and data
analysis to process optimisation. AIS offers customised MES
solutions, starting with silicon crystallization and wafer production,
via cell manufacturing and on to module production for
wafer-based solar cells and for the front end and back end areas
for the manufacturing of thinfilm solar cells.
Best 24 x 7 service solutions
Roth & Rau - Ortner provides one of the largest service networks
worldwide. Our specialists face the daily challenge to keep the
uptime of complex production and logistic equipment as high as
possible. We offer a full line of required services including: maintenance,
repairs, replacements and system extensions.
Turnkey solution features
Most advanced manufacturing process
All crystalline silicon wafers feasible
(Mono, Multi, UMG,…)
Fully automated, no human interference
Up to 70 MW/a production capacity per line
Professional project management
and fast time to market.

Advanced Solar Cell Manufacturing
Basing on the long-term experience in solar cell manufacturing
technology, Roth & Rau offers turnkey solutions for modern solar
cell production facilities. The basic concept has been designed to
provide a continuously operating production line with un-interrupted
material flow, high performance in terms of throughput,
yield and cell quality at simultaneously low running costs. An integrated
manufacturing equipment and technology package provides
to the customer the technical equipment suite, technological
support and knowledge transfer with respect to the manufacturing
process itself as well as to facility requirements issues and
cost aspects.
wafer breakage. Production monitoring systems can be provided
as an option. Roth & Rau also takes care of training of operating
labour and technology staff on site during start-up and thereafter.
As a consequence the turnkey concept of Roth & Rau provides a
cost-effective factory, latest state of the art equipment with
absolutely production proven systems, high end technology
through high quality performance processes and with a high level
of automation, leading to a high yield at simultaneously low running
costs.
In addition Roth & Rau offers its great experience in the evaluation
process for the technical equipment used to provide the best
combination of tools for certain performance level top suit the
specific financial budget of the customer. The tool package provides
the possibility to produce crystalline silicon solar cells at a
high performance level using silicon wafers as incoming material.
The specifically used material depends on the inquiry of the customer.
The concept is absolutely flexible on the used materials
(mono as well as multi crystalline wafers), wafer sizes and
shapes. The proposed manufacturing lines include the equipment
for the solar cell production as well as metrology equipment and
automation tools on a certain level, using low-contact handling
technologies wherever possible to minimise the opportunity for

ASCM
Advanced Solar Cell Manufacturing
Different layout-concepts
available
A B C
A B C
Saw damage etch,
Texturing
Phosphorus source
deposition
Ermitter diffusion
Phosphorus glass etch
(including edge isolation)
Roth & Rau
Group
Manufacturing Execution System (MES software solutions)
Other
Suppliers
Wafer handling automation

D E F
D E F
Antireflection
coating
Printing and Drying Firing Test and Sort

Specifications
Efficiency
V2.0 LDSE HJT
Laser Doped Hetero Junction
Selective Emitter Technology
Multi 16.2% 16.6%
Mono 17.0% 17.5% 19.0%
Throughput
2.400 W/h
Uptime 87.0%
Yield 95.0%
Scope of delivery
Facility construction assistance
(full facility construction on
request via partners)
Equipment procurement, delivery,
move-in and hook-up
Full manufacturing process ramp
Training of staff
Manufacturing execution
and metrology packages
Worldwide professional
after sales service
Professional project management

High Efficiency
Solar Cell Manufacturing
New steps for our turnkey production lines
PRiMELiNE LDSE
Roth & Rau provides the new laser doped selective emitter (LDSE)
solar cell structure which is developed in a cooperation with the
University of New South Wales (UNSW).
LDSE is a simple, low cost and high throughput process for the
world‘s highest efficiency solar cell manufacturing lines.
textured front SiNx
passivation
light emitter diffusion
(n + )
heavily doped
Cu plated fingers
laser-melted fingers
(n ++ )
p-type
substrate
Advantages
Selective emitter structure with a
self aligned, plated front metal grid
Suitability for both – monocrystalline
and multicrystalline wafers
Lower cost of ownership than
conventional screen printed lines
High electrical and mechanical yield
Broad process windows
Efficiencies of:
18.5% on Mono crystalline wafers
17.0% on Multicrystalline wafers
PRiMELiNE HJT
PRiMELiNE HJT is a new path to highest efficiency cell production
for mono c-Si.
In 2008 Roth & Rau has entered a cooperation with EPFL/IMT
and has started a research lab in Neuchatel, Switzerland. In
the meantime Hetero Junction Technology (HJT) - based high
efficiency full size cells have already been produced in the
Roth & Rau pilot line confirming the high efficiency potential of
HJT cells and the transfer to mass production tools is proceeding.
Low temperature-based HJT cell manufacting offers high cell efficiencies
on n-type mono c-Si substrates. HJT is compatible with
thin wafer substrates.
ITO
p + µc-Si:H
i a-Si:H
Advantages
Highest efficiency Hetero
Junction technology
N-type monocrystalline Si wafers
Excellent passivation with i a-Si:H
Low temperature processing
Compatible with thin wafers
Excellent temperature coefficient
Efficiency of 19%
n c-Si
i a-Si:H
n + µc-Si:H
ITO
AI or Ag

Process
process gases SiH 4 /NH 3 (optional: H 3 )
deposition temperature
450°C max.
process pressure
0,05...0,5 mbar
microwave power
2 x 3 kW (cw) max. (each plasma source)
deposition rate
20...100 nm/min
film thickness uniformity
within +/- 3% over one carrier, within +/- 2,5% from carrier to carrier
refractive index 1,9...2,3, uniformity over one carrier and from carrier to carrier within +/- 1%
Roth & Rau AG
An der Baumschule 6-8
09337 Hohenstein-Ernstthal
Germany
Phone +49 (0) 3723 3723 66 -85 660
85 - 0
Fax +49 (0) 3723 3723 66 -85 66100
85 - 100
E-mail info@roth-rau.de
www.roth-rau.de