International Technology Roadmap for PV - PVMC
International Technology Roadmap for PV - PVMC
International Technology Roadmap for PV - PVMC
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ITR<strong>PV</strong> Results – Processes – <strong>Technology</strong> ( Cell 2)<br />
Cell front side (n-doped emitters ):<br />
- emitter sheet resistance increase is needed<br />
reduced FS J0 to below 100 fA/cm²<br />
enable contacting by new pasts and/or SE<br />
- Reduction of finger width w/o losses in<br />
conductivity down to 40µm<br />
screen printing improves<br />
new techniques <strong>for</strong> fine line print<br />
CoO has to be competitive<br />
- Improved alignment accuracy <strong>for</strong> SE,<br />
double printing and new cell concepts<br />
2nd Annual c-Si <strong>PV</strong>MC Workshop,<br />
10 July 2013, San Francisco, USA<br />
ITR<strong>PV</strong> 4 th Edition – Results 2012<br />
19
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