Hitachi Chemical Metal CMP Slurry and Low-K Material
Hitachi Chemical Metal CMP Slurry and Low-K Material
Hitachi Chemical Metal CMP Slurry and Low-K Material
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Young's modulus (GPa)8765Influence of Young’s modulus on Cu-<strong>CMP</strong><strong>CMP</strong> passed (Blanket wafer)OK !HSG-7000HSG-80004×3××2× ×1Delamination<strong>CMP</strong> failed01.5 2 2.5 3 3.5Dielectric constantRequirements for low k1) Bulk k : < 2.22) Modulus : > 4GPa3) Good Adhesion to CVD(Selection of CVD film)SOGCap CVDCohesive fractureSOGCross Sectional SEMCourtesy of <strong>Hitachi</strong> CentralResearch Laboratory
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