Macquarie Electronics USA Inc. DNS SS-3000 Wafer Scrubber
Macquarie Electronics USA Inc. DNS SS-3000 Wafer Scrubber
Macquarie Electronics USA Inc. DNS SS-3000 Wafer Scrubber
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<strong>Macquarie</strong> <strong>Electronics</strong> <strong>USA</strong> <strong>Inc</strong>.<strong>DNS</strong> <strong>SS</strong>-<strong>3000</strong> <strong>Wafer</strong> <strong>Scrubber</strong>SN 700808393A• Currently Configured for 300mm wafer sizes• MFG Date: Jan 2006• Cassette Interface (FOUP Station):o (3) 300mm FOUP Load-Ports• Shinko Electric SELOP12F25-S301010o Entegris F300 FOUPso <strong>Wafer</strong> Pitch: Standard full pitcho Overhead Transport Interface (OHT)o E84 Parallel I/O Sensorso E99 Carrier ID Readero RF Tag Readers: Omron Tiris• Main System:o System Type: DI System (All Teflon DI fluid flow)o Indexer: (1) Kawasaki TS-310-D512S• <strong>DNS</strong> PN: 2-39-72838o Indexer: (1) YaskawaXU-ACT1531o Main System Robot: Kawasaki TS-520-D512S• <strong>DNS</strong> PN: 2-39-81303o Main Controller• Original OS: Win-2000 Server, upgraded to Vistao Host Controller• Original OS: Win-2000 Pro, upgraded to Vista• Micron Host Interface: TAR 1.5 complianto (2) USB 2.0 portso Integrated Particle Enclosure (mini-environment)o User Interface• System Safety:o FM4910 Compliant (
<strong>Macquarie</strong> <strong>Electronics</strong> <strong>USA</strong> <strong>Inc</strong>.• Process Module 1/2/3/4:o Mechanical Chuck (Magnetic), <strong>3000</strong>RPM limito Nozzles: TMAH, DIWo Front-Side:• Rinse: Cold DIW• Position: Center of <strong>Wafer</strong>• Max Flow: 1000mL/Mino Back-Side:• Rinse: Cold DIW• Max Flow: 500mL/Mino Nano Spray:• N2 Rate: 10-100LPM (MFC Controlled)• N2 Filter: Mykrolis WGMX-MBX-S3• Rinse: Cold DIW• DIW Max Flow: 20-200mLPM (needle valve controlled)o Scanning: Reciprocating in range of wafer diametero Working Distance: 10mm from <strong>Wafer</strong> Surfaceo Lower Cup Material: PPo Back-Side Rinse VAT Material: PVCo Material Body: PTFEo Wetted Surface: PTFE, PFAo Brush:• Scrubbing System <strong>Inc</strong>luded• PVA Brush <strong>Inc</strong>luded• Scan Range: <strong>Wafer</strong> to Edge• Note: PM-1&2 have Bevel Brush• Scan Speed: 5-150mm/s• Pressure Control: 10-80grams• Rotation Control: 0-267RPM• Cleaning System: Max 1LPMo E-Flow CO2 Systemo Alkali Drain Line: BWW / 1W (Air/Water separation)o Alkali Exhaust Lineo Exhaust Control: Manual• Reverser Unit:o <strong>Wafer</strong> Flipping assembly includedo Drive Type: Pneumatico <strong>Wafer</strong> Sensor: Optical Photo Sensor• Facilities:o Move-In Restrictions: W-2600, D=1350, H=2680o Adjuster Plate: <strong>SS</strong> (304) (#6, 100mmx100mm & #6, 200mmx200mmo Seismic Supporto Mylar Floor System Templateo Pneumatic Chemical Supply Interfaceo Exhaust Interface: Bottomo Chemical Line Connections: Bottom (C.S.S.)This data sheet is provided to you on a strictly confidential basis and contains commercially sensitive and valuable information. No part of its content may be providedto any person without our prior written consent. This data sheet is not an offer capable of acceptance. The information contained in this data sheet is, to our knowledgeand information, accurate, but it may contain typographical errors and we do not warrant the completeness or accuracy of the information contained herein. Any offerby you to purchase of the equipment described in this data sheet shall be subject to our standard terms and conditions of sale.Interested parties may contact Matt Hayes at <strong>Macquarie</strong> <strong>Electronics</strong> for additional information at (408) 965-3863 ormatt.hayes@macquarie.com.Visit our web site at www.macquarie.com/electronicsImportant Information www.macquarie.com/uk/important_information.htm© 2012 <strong>Macquarie</strong> Group
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