HigH Voltage Pulsed generators - Physical Instruments

The ion beam center of the Institute of Ion Beam
Physics and Materials Research at the Dresden-Rossendorf
Research Center carries out basic research in
the areas of materials science as well as modification
and analysis of solid surfaces using ion beams.
In addition to various types of metal, hard material
and functional layers for biomedical, electronic, magnetic,
optical and tribological applications, semiconductor
layers are also a research emphasis.
The Institute operates a cross-regional and international
ion beam center, user facility of the European
Community as CENTER FOR APPLICATION OF ION
BEAMS IN MATERIALS RESEARCH (AIM) and SUPPORT
OF PUBLIC AND INDUSTRIAL RESEARCH USING ION
BEAM TECHNOLOGY (SPIRIT) which makes its facilities
available to outside users from universities, other
research institutes and industry from the European
Union while offering services such as technology
transfer related to ion beam technologies.
The effect of ion bombardment on the generation
and modification of thin films is studied experimentally
and using computer simulation. In the experimental
area targeted in situ real time diagnostic
procedures are employed in order to understand the
processes in detail and optimise them. The focus of
the studies includes, in addition to the relationships
between structure and properties, various possible
applications. An important component of the research
and development on new thin film systems
is the use of low-energy ions and the use of pulsed
plasma for generating metastable phases, high film
densities, extraordinary adhesion of films, nanostructures
or special textures.
A closed cooperation and interaction with industrial
partners is focused on the technology transfer of
modern ion technologies and the development of
high-tech equipment in this field.
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