HigH Voltage Pulsed generators - Physical Instruments

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Surface hardening and wear protection of metals by PBII If proper ions are implanted into metallic substrates, for instance nitrogen ions in titanium, the surface sensitive properties of the substrate material are remarkably changed, hence due to the stopping range of the implanted ions, in case of PBII only up to a depth of less than 1 µm. Larger modification depth’s will be obtained, if the implantation is done at elevated temperatures, resulting in a diffusion of the implanted ions. Further investigations concern the nitridation and boronisation of HSS and hard metals and surface hardening of Al and Mg in many medical applications. Nitrogen ion implantation into austenitic stainless steel at elevated temperatures of 350 – 400 °C leads to a significant increase in the surface hardness while the specific wear volume is reduced by several orders of magnitude. A fast diffusion leads to the formation of layers with a thickness of up to 0.05 mm in a technologically useful timeframe. The surface hardness itself reaches values between 1300 and 1700 HV, thus the obtained layer thickness is more than sufficient for typical applications. At the same time, the corrosion properties of the base material are maintained. (Forschungszentrum Dresden Rossendorf applied RUP1, RUP4, and RUP6) Nitrided layer by PBII X%CrNiMo 17.12.2, Plasma Based Ion Implantation, 40kV, 380 ˚C, 10 hours Basic material Nitrided layer Wear improvement by PBII Corrosion behaviour after PBII in comparison to untreated and plasma nitrided surfaces X5CrNiMo17.12.2
MF <strong>Pulsed</strong> Reactive Dual Magnetron Sputtering of Nb2O5 Hydrogen depth profile obtained by nuclear reaction analysis data for Nb2O5 films with open (blue) and closed (red) pores. Optical applications require highly homogeneous, amorphous oxide material with high refractive index, low extinction, mechanical stress and thermal shift. The reactive pulsed magnetron sputter deposition facility is optimized to produce dense Nb2O5 films with refractive index n>2.5 and extinction coefficient k~6x10-4 at light wavelength of 400 nm, mechanical stress of -90 MPa, nearly zero thermal shift, and hydrogen content below 1%. The optimum films are denser compared to ordinary ones, and contain closed pores (Nb2O5_1_closed pores, Nb2O5_1_open_pores). Such closed pores should relax the mechanical stress and do not lead to significant thermal shift of the optical properties. The nuclear reaction analysis data show that the optimum films are nearly hydrogen free, which confirms assumption about the closed pores (Nb2O5_2). (Forschungszentrum Dresden Rossendorf applied RUPmag) Overview TEM images of the Nb2O5 films grown by reactive medium frequency pulsed magnetron sputtering with open and closed pores.
Page 1 and 2: HigH Voltage Pulsed generators
Page 3 and 4: The ion beam center of the Institut
Page 5 and 6: For applications demanding high vol
Page 7: The device serie RUP (Rossendorf Un
Page 11 and 12: Advanced Implantation and Coating T
Page 13 and 14: Ion induced stress relaxation in cB
Page 15 and 16: Reactive MF Pulsed Dual Magnetron S

HigH Voltage Pulsed generators - Physical Instruments

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