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Nitrile Oxides, Nitrones, and Nitronates in Organic Synthesis : Novel ...

Nitrile Oxides, Nitrones, and Nitronates in Organic Synthesis : Novel ...

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PRINCIPAL PHYSICOCHEMICAL DATA AND CHARACTERISTICS 511<br />

to the nature of the solvent. All of these factors correspond to an <strong>in</strong>tramolecular<br />

process <strong>and</strong> the transition state A presented <strong>in</strong> Scheme 3.75 (Eq. 2).<br />

This character of the process is <strong>in</strong>directly conÞrmed by the X-ray diffraction<br />

data for compounds (80) <strong>and</strong> (81) (Table 3.14), <strong>in</strong> which the distance from the<br />

silicon atom to the valence bound O(1) atom is approximately 0.8 ûA smaller<br />

than the sum of the van der Waals radii of these atoms. It should be noted that<br />

the bond angles at the silicon atom are somewhat distorted. For example, the<br />

O–Si–CMe3 angle is substantially smaller than the tetrahedral angle (100.6 ◦ <strong>and</strong><br />

97.5 ◦ , respectively). The Si–CMe3 <strong>and</strong> Si–O bonds are slightly elongated. In the<br />

authors’ op<strong>in</strong>ion (178), a distortion of the geometry of the silyl fragment <strong>in</strong> the<br />

crystals of (80) <strong>and</strong> (81) cannot be attributed to a steric factor. This distortion is<br />

evidence for the orientation of the silyl fragment <strong>in</strong> the Þeld of the oxygen atom,<br />

which is not bonded to this fragment. The same <strong>in</strong>termediate structure should lie<br />

on the path from SENA to the transition state A for a concerted process (Scheme<br />

3.75, Eq. (2)). The relatively high negative entropy of activation of the process<br />

also suggests that this process is electrocyclic.<br />

Interest<strong>in</strong>gly, the migration rate of the Si group <strong>in</strong> nitronates (95a,b) (Scheme<br />

3.75) is so high that the methyl groups cannot be dist<strong>in</strong>guished by the NMR<br />

method by lower<strong>in</strong>g the temperature at which the spectra are measured to -100 ◦ C.<br />

(Now the migrations of organosilyl fragment <strong>in</strong> different organic compounds were<br />

studied (286–288). A decrease <strong>in</strong> the 1,3-XY-migration rates of the silyl group<br />

<strong>in</strong> the presence of electronegative substituents was documented (286).)<br />

It should be emphasized that <strong>in</strong> no case were derivatives of AN conta<strong>in</strong><strong>in</strong>g<br />

the C–Si bond detected, although the formation of these compounds <strong>in</strong> certa<strong>in</strong><br />

silylation reactions as k<strong>in</strong>etic products cannot be ruled out. In particular, this can<br />

be expected for nitronates (51 h,i) (Scheme 3.57) generated <strong>in</strong> the reactions of<br />

silylated dimethylformamides with conjugated nitro oleÞns (202), because this<br />

reaction with other Michael substrates affords products with the C–Si bond.<br />

It is notable, that a reversible migration of the silyl fragment from oxygen<br />

to the nitrogen atom bear<strong>in</strong>g the nitro group occurs <strong>in</strong> silyl derivatives of<br />

N-nitroam<strong>in</strong>es (Scheme 3.76) (289). The mechanism of 1,3-N,O-migration<br />

of the silyl fragment is analogous to that of 1,3-N,O-migration of the silyl<br />

fragment <strong>in</strong> SENAs (through a cyclic transition state), <strong>and</strong> both of these processes<br />

are characterized by similar k<strong>in</strong>etic parameters.<br />

R O<br />

RN(NO2)SiMe2R′ N N<br />

OSiMe2R′<br />

O<br />

N N<br />

R OSiMe2R′ R - Me, Et, NCCH2CH2; R′ - Me, Pr i , Bu t<br />

Scheme 3.76

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