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Nitrile Oxides, Nitrones, and Nitronates in Organic Synthesis : Novel ...

Nitrile Oxides, Nitrones, and Nitronates in Organic Synthesis : Novel ...

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R 2<br />

R 3<br />

R 1<br />

NO 2<br />

SiX/Et3N<br />

(1)<br />

SILYLATION OF NITRO COMPOUNDS AS A PROCESS 619<br />

R 2<br />

R 2<br />

R 3<br />

R 3<br />

R 1<br />

AN SENA<br />

(2)<br />

333<br />

R 1<br />

O<br />

N<br />

SiX/Et3N<br />

OSi<br />

N(OSi)2<br />

Scheme 3.197<br />

SiX/Et3N<br />

(3)<br />

SiX/Et3N<br />

(4)<br />

OSi<br />

R1 R3 R2 +<br />

NEt3 R1 R3 R2 can be rapidly rearranged <strong>in</strong>to oximes (334) or give quaternary ammonium salts<br />

(335). (These reactions will be considered <strong>in</strong> more detail <strong>in</strong> Section 3.5.4.3.)<br />

Stability of BENA (333) depends not only on the nature of the silylat<strong>in</strong>g reagent<br />

used but also on the reaction conditions <strong>and</strong> the nature of the start<strong>in</strong>g AN.<br />

Interest<strong>in</strong>gly, bases <strong>and</strong> water have different effect on stability of BENA <strong>and</strong><br />

<strong>in</strong>termediate SENA. Additives of tertiary am<strong>in</strong>es stabilize SENAs (191), whereas<br />

bases cause spontaneous decomposition of BENAs. SENAs are hydrolytically<br />

unstable, whereas BENAs are <strong>in</strong>ert toward water under neutral conditions.<br />

An <strong>in</strong>crease <strong>in</strong> the strength of silyl Lewis acid leads to an <strong>in</strong>crease <strong>in</strong> the rate<br />

of the AN→BENA process <strong>and</strong> allows one to use milder conditions. In addition,<br />

the rate ratio K4/K2 (Chart 3.20) sharply <strong>in</strong>creases. For example, the generation<br />

rate of respective BENA is approximately equal to the rate of consumption of<br />

the correspond<strong>in</strong>g <strong>in</strong>termediate SENA <strong>in</strong> double silylation of 2-nitropropane with<br />

Me3SiCl (187). This SENA was not detected among the products of silylation of<br />

2-nitropropane <strong>in</strong> the presence of even a smaller amount of Me3SiOTf.<br />

In special studies, several procedures were developed (465–468) for the onepot<br />

synthesis of the correspond<strong>in</strong>g BENA <strong>in</strong> good yields from the overwhelm<strong>in</strong>g<br />

majority of various AN, the amounts of impurities be<strong>in</strong>g m<strong>in</strong>imum (Table<br />

3.18).<br />

To <strong>in</strong>crease stability of the target substrates, wash<strong>in</strong>g of the result<strong>in</strong>g reaction<br />

mixture with an aqueous NaHSO4 solution was <strong>in</strong>cluded as a necessary step <strong>in</strong><br />

st<strong>and</strong>ard procedures for the synthesis of BENA.<br />

However, <strong>in</strong> some cases, it is worthwhile to synthesize BENA <strong>in</strong> two steps by<br />

isolat<strong>in</strong>g <strong>in</strong>termediate SENA (see, <strong>in</strong> particular, entries 10 <strong>and</strong> 22, Table 3.18).<br />

It is particularly difÞcult to synthesize BENA from AN disubstituted at the<br />

β-carbon atom.<br />

N<br />

334<br />

X −<br />

N<br />

335<br />

OSi<br />

OSi

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