Combined use of in-situ curvature and full- wafer ... - Laytec
Combined use of in-situ curvature and full- wafer ... - Laytec
Combined use of in-situ curvature and full- wafer ... - Laytec
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Shear stress on the (1-11)[10-1] <strong>and</strong> (1-11)[0-1-1] slip system<br />
10 ºC Radial temperature variations<br />
Temperature ( o C)<br />
Temperature ( o C)<br />
1005<br />
1000<br />
995<br />
990<br />
1005<br />
1000<br />
995<br />
990<br />
Temperature pr<strong>of</strong>ile 1<br />
-10 0 10 20 30 40 50 60 70 80<br />
Radial distance (mm)<br />
Temperature pr<strong>of</strong>ile 2<br />
0 10 20 30 40 50 60 70 80<br />
Radial distance (mm)<br />
Wafer centre Wafer edge<br />
Max stress ~2 MPa<br />
Max stress ~1 MPa<br />
Stress calculations: courtesy <strong>of</strong><br />
Kirsten McLaughl<strong>in</strong>, Cambridge<br />
10