27.02.2013 Views

Combined use of in-situ curvature and full- wafer ... - Laytec

Combined use of in-situ curvature and full- wafer ... - Laytec

Combined use of in-situ curvature and full- wafer ... - Laytec

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

Shear stress on the (1-11)[10-1] <strong>and</strong> (1-11)[0-1-1] slip system<br />

10 ºC Radial temperature variations<br />

Temperature ( o C)<br />

Temperature ( o C)<br />

1005<br />

1000<br />

995<br />

990<br />

1005<br />

1000<br />

995<br />

990<br />

Temperature pr<strong>of</strong>ile 1<br />

-10 0 10 20 30 40 50 60 70 80<br />

Radial distance (mm)<br />

Temperature pr<strong>of</strong>ile 2<br />

0 10 20 30 40 50 60 70 80<br />

Radial distance (mm)<br />

Wafer centre Wafer edge<br />

Max stress ~2 MPa<br />

Max stress ~1 MPa<br />

Stress calculations: courtesy <strong>of</strong><br />

Kirsten McLaughl<strong>in</strong>, Cambridge<br />

10

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!