Methodologies for Assessing On-line Probe Process Parameters

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Thank you! you Questions? Questions
Page 1 and 2: Jan Martens NXP Semiconductors Germ
Page 3 and 4: Motivation Joint Venture Overview F
Page 7 and 8: Feinmetall ViProbe ® New Beam Mate
Page 9 and 10: Controlled Test Conditions • Benc
Page 11 and 12: NXP Testcenter Hamburg Production E
Page 13 and 14: Contact Resistance (CRES) • Conta
Page 15 and 16: Fritting - Theory • The vertical
Page 17 and 18: Fritting - Theory • Current must
Page 19 and 20: Probe Tip Contact Pad Fritting - Wh
Page 21 and 22: Experimental Data / Parameters •
Page 23 and 24: Bathtub Experiments • Test Sequen
Page 25 and 26: Contact Resistance Cres [Ohm] 1000
Page 27 and 28: CRES vs. Current • Test Sequence
Page 29 and 30: Visualization of Test • Pin-to-Pi
Page 31 and 32: Contact Resistance Cres [Ohm] 10 8
Page 33 and 34: SEM Images after 20K TD Longterm Te
Page 35 and 36: CRES Longterm Tests CRES Histogram
Page 37 and 38: Exist Mat New Mat SEM Images after
Page 39 and 40: Production CRES Measurement • Sma
Page 43 and 44: Results & Future Work II (many inte
Page 45: Men At Work June 11 / 2008 Martens,

Methodologies for Assessing On-line Probe Process Parameters

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