functionalized surfaces on porous silica by atomic layer ... - Aaltodoc

CONTENTS
1. INTRODUCTION 10
2. GENERAL BACKGROUND 12
2.1 Deposition of silanes onto silicon dioxide <strong>surfaces</strong> 12
2.2 Atomic layer deposition 17
2.2.1 Principle of ALD 17
2.2.2 Applications of ALD 19
2.2.3 Requirements for substrate, precursor, and reaction conditions 21
3. EXPERIMENTAL 23
3.1 Materials 23
3.2 ALD procedure 24
3.2.1 Deposition of a single surface-saturated molecular layer of γ-amino- 24
propylalkoxysilanes and a high-density aminopropylsiloxane network
3.2.2 Deposition of several surface-saturated molecular layers of organic 26
precursors
3.3 Characterization techniques 26
4. RESULTS AND DISCUSSION 28
4.1 Characterization of silica 28
4.1.1 Qualitative study of the effect of heat treatment on the surface 28
species of silica by DRIFTS
4.1.2 Determination of surface silanol groups by TG and 1 H MAS NMR 30
4.1.3 Quantitative determination of silanol groups by DRIFTS/PLS procedure 33
4.2 Modification of silica with γ-aminopropylalkoxysilanes 35
4.2.1 Deposition of a single surface-saturated molecular layer of 35
γ-aminopropylalkoxysilanes on silica
4.2.1.1 Effects of heat-treatment of silica and type of precursor 37
4.2.1.2 Effect of reaction temperature 39
4.2.2 Deposition of a high-density aminopropylsiloxane network on silica 42
4.3 Growth of organic multilayered polyimide structures on amino-<strong>functionalized</strong> 45
silica
5. CONCLUSIONS 48
6. REFERENCES 50
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