functionalized surfaces on porous silica by atomic layer ... - Aaltodoc

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LIST OF ABBREVIATIONS AND ACRONYMS AAPS N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane ALCVD Atomic Layer Chemical Vapor Deposition ALD Atomic Layer Deposition ALE Atomic Layer Epitaxy ALG Atomic Layer Growth APDMES γ-Aminopropylethoxydimethylsilane APDMS γ-Aminopropyldiethoxymethylsilane APTMS γ-Aminopropyltrimethoxysilane APTS γ-Aminopropyltriethoxysilane BDMADMS Bis(dimethylamino)dimethylsilane BET Brunauer-Emmett-Teller CP Cross Polarization CRAMPS Combined Rotation And Multiple Pulse Spectroscopy CVD Chemical Vapor Deposition DAH Diaminohexane DLE Digital Layer Epitaxy DMCSE 1-(Dimethylchlorosilyl)-2-(p, m-chloromethylphenyl)ethane DMDM Dimethyldimethoxysilane DTA Differential Thermal Analysis DTG Derivative of the TG curve DRIFT/S Diffuse Reflectance Fourier Transform Infrared /Spectroscopy FTIR Fourier Transform Infrared HFTS Heptadecafluorodecyltrichlorosilane HMDS 1,1,1,3,3,3-Hexamethyldisilazane, (CH3)3-Si-NH-Si-(CH3)3 IR Infrared MAS Magic Angle Spinning MDD Molecular Designed Dispersion MDMS Methyldimethoxysilane MLD Molecular Layer Deposition MLE Molecular Layer Epitaxy MPTMS 3-Mercaptopropyltrimethoxysilane 7
MTES Methyltriethoxysilane MTMS Methyltrimethoxysilane NFTS Nonafluorohexyltrichlorosilane NMR Nuclear Magnetic Resonance spectroscopy OSC Orthogonal Signal Correction PLS Projections to Latent Structures by means of Partial Least Squares PMDA Pyromellitic dianhydride, 1,2,3,5-benzenetetracarboxylic anhydride RMSEP Root Mean Squared Error of Prediction TA Thermal Analysis, thermoanalytical TDMCS p-Tolyldimethylchlorosilane TEA Triethylamine TEOS Tetraethoxysilane TES Triethylsilanol TFTS Trifluoropropyltrichlorosilane TG Thermogravimetry TMCS Trichloromethylsilane TMES Trimethylethoxysilane TMMS Trimethylmonomethoxysilane TMOS Tetramethoxysilane TMSCl Tris(trimethylsiloxy)chlorosilane 8
Page 1 and 2: Helsinki University of Technology I
Page 3 and 4: Distribution: Helsinki University o
Page 5 and 6: PREFACE The experimental work of th
Page 7: THE AUTHOR’S CONTRIBUTION TO THE
Page 11 and 12: 1. INTRODUCTION There is growing in
Page 13 and 14: 2. GENERAL BACKGROUND As background
Page 15 and 16: Figure 2. Gas-phase deposition of
Page 17 and 18: 3-Bromopropyltrichlorosilane Glass
Page 19 and 20: the number of cycles applied. Adjac
Page 21 and 22: announced ALD to be the method-of-c
Page 23 and 24: precursor molecules compared to the
Page 25 and 26: Figure 5. Distilled water was used
Page 27 and 28: 3.2.2 Deposition of several surface
Page 29 and 30: 4. RESULTS AND DISCUSSION The effec
Page 31 and 32: Wave number/ cm -1 Figure 8. DRIFT
Page 33 and 34: Table 3. Results from TG and 1 H MA
Page 35 and 36: Various signal-processing technique
Page 37 and 38: 450 °C, the sharp peak due to free
Page 39 and 40: only monodentately bound, but also
Page 41 and 42: mono- and bidentate bonding modes o
Page 43 and 44: The reaction of the amino groups of
Page 45 and 46: APTS molecules/ nm 2 Carbon atoms/
Page 47 and 48: Figure 20. Deposition of pyromellit
Page 49 and 50: 5. CONCLUSIONS Because ALD growth i
Page 51 and 52: 6. REFERENCES 1. Vansant, E.F., Van
Page 53 and 54: 64. Haller, I., J. Amer. Chem. Soc.
Page 55 and 56: 135. Maciel, G.E. and Sindorf, D.W.

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