functionalized surfaces on porous silica by atomic layer ... - Aaltodoc

high-density aminopropylsiloxane network, which can be considered as a monolayer, could
be deposited on silica because the surface was observed to be saturated with the precursor
molecules. The results obtained from these experiments on porous substrates can further be
applied to planar substrates, and valuable information on the surface chemistry and deposition
process on <strong>surfaces</strong> can be obtained.
As shown in this work, ALD enables a controlled deposition of <strong>functionalized</strong> <strong>surfaces</strong>, in
addition to the oxides, sulfides, and nitrides earlier deposited on porous supports for catalyst
applications. It was also shown that even more complex organic layers, such as polyimides,
could be deposited on <strong>functionalized</strong> <strong>surfaces</strong>. In the present study polyimide structures were
deposited on aminosilylated silica using PMDA and DAH as precursors. Low temperatures
are especially desired to prevent decomposition of organic precursors. Pressure within the
ALD reactor should be as low as possible, so as to provide the lowest vaporization and
deposition temperatures. In addition to the present ALD applications, ALD has great potential
for industrial applications in the future in completely novel areas where organic layers may be
applied to planar or porous substrates.
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