Semiconductor Equipment Seminar Series - Owens Design
Semiconductor Equipment Seminar Series - Owens Design
Semiconductor Equipment Seminar Series - Owens Design
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Press Release<br />
For Immediate Release<br />
9 A.M. EDT, March 12, 2013<br />
Christopher Castillo<br />
Castle Communications<br />
408-244-0657<br />
eccastillo1798@sbcglobal.net<br />
<strong>Owens</strong> <strong>Design</strong> Collaborates with Leading Nanoimprint<br />
Provider to Deliver Advanced, Production-Ready<br />
Lithography Tool<br />
Customized Automated Solutions Enable Low Risk, Low Cost Entry into New<br />
Market Applications<br />
Fremont, California: <strong>Owens</strong> <strong>Design</strong> Inc. today announced the completion of a<br />
collaborative tool development effort with a leading innovator in the field of nanoimprint<br />
technology. The two companies worked closely together to develop and manufacture a<br />
production-ready advanced nanoimprint lithography tool that has the ability to process a<br />
variety of wafer and substrates sizes. By working with <strong>Owens</strong> <strong>Design</strong>, this nanoimprint<br />
technology leader was able to cost effectively bring its next-generation technology to<br />
market quickly and at a lower risk.<br />
<strong>Owens</strong> <strong>Design</strong> is an equipment design and manufacturing service company that offers<br />
capital equipment manufacturers a proven methodology to reduce overall tool<br />
development costs, minimize time to market, and reduce overall technical risk. This<br />
collaborative technique for tool design and build allowed <strong>Owens</strong> <strong>Design</strong>’s nanoimprint<br />
development partner to focus its internal design efforts on its own core technology. In<br />
turn, <strong>Owens</strong> <strong>Design</strong> focused on integrating this new core technology into a system level<br />
platform that had been optimized to meet the equipment manufacturer’s performance<br />
and cost specifications.<br />
“One of the keys to maintaining technology leadership, for an equipment OEM, is the<br />
ability to quickly deliver their technology to the market in a fab-ready tool,” said John<br />
Apgar, <strong>Owens</strong> <strong>Design</strong>’s president. “Collaborating with <strong>Owens</strong> <strong>Design</strong> enables our<br />
partners to focus on their core technology development, while we focus on the systemlevel<br />
issues dealing with automation, control and software that must be resolved to<br />
deliver a truly production-worthy platform. Working with <strong>Owens</strong> <strong>Design</strong>, enabled this<br />
provider of advanced nanoimprint technology to minimize the overall risks involved in<br />
tool development, while also significantly speeding its time to market.”
For more information, please contact www.owensdesign.com or Lauren Ravenscroft, North<br />
American Sales Manager lravenscroft@owensdesign.com<br />
—End—<br />
About <strong>Owens</strong> <strong>Design</strong><br />
<strong>Owens</strong> <strong>Design</strong> specializes in engineering and manufacturing of capital equipment. Located<br />
in Silicon Valley for over 25 years, they have been a strategic partner in the co-creation and<br />
manufacturing process for many leading OEM capital equipment companies.<strong>Owens</strong> <strong>Design</strong><br />
engineers and manufactures customer's products from concept, through alpha, beta, pilot<br />
and on-going production. Their development process results in a rapid design cycle and<br />
concurrent manufacturing introduction. <strong>Owens</strong> <strong>Design</strong> has been an innovative and reliable<br />
partner for equipment companies in the semiconductor, solar and related industries.
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