'Thin films & coatings' Roadmap - Nano Mahidol

• Lack of understanding of decomposition process during spraying – plasma
chemistry (for silicates)
• Difficulties for achieving compounds stoichiometrically stable (metal oxides).
Experts were asked to identify crucial bottlenecks considering different types of
materials. Answers show that (except for metal thin films), the lack of understanding
of adhesion mechanisms between thin film and substrate and how properties are
transferred and influence thin film properties are a common bottleneck that must be
addressed.
The fact that many technologies are application-driven makes the understanding of
industrial requirements a repeatedly highlighted bottleneck both for experts from
academia and industry. That’s especially relevant in the semiconductors’ industry,
where technologies should be integrated into existing industrial production processes
if they’re to be applied within the next 10 years.
Software availability is also a broad bottleneck. However, overcoming this barrier
requires first to overcome the afore-mentioned ones.
Similarly, the lack of appropriate equipment is also considered a bottleneck in all
material-related research except for silicon (probably due to the broad and long used
made of thin film technologies by the semiconductors industry).
24 Roadmap report on
Thin films and coatings