Flare distance

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Summary• Early results of 2 unique flare evaluation methods are shown.– Donut patterns: huge spillover area at < 2 μm outer radiusfor Resist A and B. (No data yet for Resist C.)– LS pattern: resists with long diffusion lengths show higher ηvalues. η strongly depends on resist material.MagnitudeResist Along DLResist Bshort DLResist Clong DLη 18.4 % 6.45 % 14.6%PSF Same trend No dataDistance LS edge Few μm ~16 μm 23 μm• These results will be utilized for our next device demo.2008 International Symposium on Extreme Ultraviolet Lithography 14
AcknowledgementsThis work was performed by the Research Alliance Teamsat various IBM Research and Development Facilities• ASML– Kevin Cummings– Bill Pierson– Sang-In Han– Rick Zachgo• College of Nanoscale Science andEngineering– Sudhar Raghunathan2008 International Symposium on Extreme Ultraviolet Lithography 15
Page 2 and 3: Outline• Introduction• Flare ev
Page 6 and 7: How to determine Flare PSF from Don
Page 10 and 11: Flare distance (50nm LS w/ 100 µm-
Page 12 and 13: DxHow was = derived ?D501+η1+2ηx

Flare distance

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